Localized TDDB failures related to STI corner profile in advanced embedded high voltage CMOS technologies for power management units

Author(s):  
Yee Ming Chan ◽  
Chin Boon Moey ◽  
Hing Poh Kuan
2019 ◽  
Vol 27 (1) ◽  
pp. 377-382
Author(s):  
Guan-Qun Zhang ◽  
Athics Gu ◽  
Yi-Hui Lin ◽  
Peng Sun ◽  
Jiwei Zhang ◽  
...  

2012 ◽  
Vol 271-272 ◽  
pp. 1082-1086
Author(s):  
Shen Li Chen ◽  
Tzung Shian Wu

In an nLDMOS, both the drain-side and source-side engineering by adding Nad and Pad layers to obtain a weak snapback characteristic are presented in this work. In this paper, we will detailedly discuss the trigger voltage (Vt1) and holding voltage (Vh) distribution of a novel high-voltage (HV) nLDMOS device. It’s a novel method to reduce the Vt1 and to increase the Vh. Therefore, these efforts will be very suitable for the HV applications in power management ICs.


2015 ◽  
Vol 13 ◽  
pp. 109-120
Author(s):  
S. Pashmineh ◽  
D. Killat

Abstract. This paper presents two high-voltage circuits used in power management, a switching driver for buck converter with optimized on-resistance and a low dropout (LDO) voltage regulator with 2-stacked pMOS pass devices. The circuit design is based on stacked MOSFETs, thus the circuits are technology independent. High-voltage drivers with stacked devices suffer from slow switching characteristics. In this paper, a new concept to adjust gate voltages of stacked transistors is introduced for reduction of on-resistance. According to the theory, a circuit is proposed that drives 2 stacked transistors of a driver. Simulation results show a reduction of the on-resistance between 27 and 86 % and a reduction of rise and fall times between 16 and 83 % with a load capacitance of 150 pF at various supply voltages, compared to previous work. The concept can be applied to each high-voltage driver that is based on a number (N) of stacked transistors. The high voltage compatibility of the low drop-out voltage regulator (LDO) is established by a 2-stacked pMOS transistors as pass device controlled by two regulators: an error amplifier and a 2nd amplifier adjusting the division of the voltages between the two pass transistors. A high GBW and good DC accuracy in line and load regulation is achieved by using 3-stage error amplifiers. To improve stability, two feedback loops are utilized. In this paper, the 2.5 V I/O transistors of the TSMC 65 nm CMOS technology are used for the circuit design.


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