High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

2010 ◽  
Vol 31 (8) ◽  
pp. 857-859 ◽  
Author(s):  
Seok-Jun Won ◽  
Sungin Suh ◽  
Myung Soo Huh ◽  
Hyeong Joon Kim
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Oxygen Radical ◽  
High Quality ◽  
Organic Silicon ◽  
Layer Deposition ◽  
Metal Organic

Low temperature and high quality atomic layer deposition HfO2 coatings

2017 ◽  
Author(s):  
Alexander Pyymaki Perros ◽  
Perttu Sippola ◽  
Elisa Arduca ◽  
Leena-Sisko Johansson ◽  
Harri Lipsanen
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
High Quality ◽  
Layer Deposition

Growth of Crystalline Gd2O3Thin Films with a High-Quality Interface on Si(100) by Low-Temperature H2O-Assisted Atomic Layer Deposition

2010 ◽  
Vol 132 (1) ◽  
pp. 36-37 ◽  
Author(s):  
Andrian P. Milanov ◽  
Ke Xu ◽  
Apurba Laha ◽  
Eberhard Bugiel ◽  
Ramadurai Ranjith ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
High Quality ◽  
Layer Deposition

Low-Temperature Silicon Oxide Offset Spacer Using Plasma-Enhanced Atomic Layer Deposition for High-k/Metal Gate Transistor

2010 ◽  
Vol 49 (4) ◽  
pp. 04DB11 ◽  
Author(s):  
Tatsunori Murata ◽  
Yoshihiro Miyagawa ◽  
Yukio Nishida ◽  
Yoshiki Yamamoto ◽  
Tomohiro Yamashita ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Metal Gate ◽  
Layer Deposition ◽  
High K

Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma

2013 ◽  
Vol 2 (12) ◽  
pp. P114-P116 ◽  
Author(s):  
J.-S. Choi ◽  
B. S. Yang ◽  
S.-J. Won ◽  
J. R. Kim ◽  
S. Suh ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
O2 Plasma
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