AbstractMetasurface-based beam deflector, as an important optical element to bend the light propagation direction, has drawn a lot of interests in research to achieve miniaturization of devices and reduction of system complexity. Based on the 12-inch immersion lithography technology, in this work, an ultra-thin and large-area pixelated metasurface beam deflector with a footprint of 2500 × 2500 μm, formed by nanopillars with diameters from 221 to 396 nm, is demonstrated on a 12-inch glass wafer. The 21 × 21 array of deflectors is designed to bend the input light in different directions and to generate 441 random points. In addition, the layer transfer on the 12-inch glass wafer makes the device working in transmission mode at a 940-nm wavelength. The random point array generated from the experiment shows good match with the design. This pixelated metasurface beam deflector can generate random points simultaneously and has potential to make beam steering by switching each pixel of the beam deflector, which can be applied on motion detection, facial recognition, and light detection and ranging.
The influence of light propagation direction on the stress-induced polarization dependence of silicon waveguides