A low frequency impedance matching circuit for a one atmosphere uniform glow discharge plasma reactor

Author(s):  
Zhiyu Chen ◽  
J.R. Roth
2001 ◽  
Vol os-10 (3) ◽  
pp. 1558925001OS-01 ◽  
Author(s):  
J. Reece Roth ◽  
Zhiyu Chen ◽  
Daniel M. Sherman ◽  
Fuat Karakaya ◽  
Peter P.-Y. Tsai ◽  
...  

A technique for generating active species with the One Atmosphere Uniform Glow Discharge Plasma (OAUGDP) has been developed and used to sterilize and increase the surface energy, wettability and wickability of nonwoven fabrics. The OAUGDP is a non-thermal, fourth-state-of-matter plasma with the classical characteristics of a low pressure DC normal glow discharge that operates in air (and other gases) at atmospheric pressure. No vacuum system or batch processing is necessary, and a wide range of applications to fabrics and polymeric webs can be accommodated in a parallel plate plasma reactor. In addition to directly exposing webs and workpieces to active species for surface energy increase in a parallel-plate reactor, we have shown that active species capable of sterilization can be convected at near room temperature to a remote exposure chamber. This technology is simple, produces many effects that can be obtained in no other way, generates minimal pollutants or unwanted byproducts, and is suitable for online treatment of webs, films, and fabrics. Early exposures of nonwoven fabrics to the OAUGDP required minutes to produce relatively small increases of surface energy. These durations appeared too long for commercial application to fast-moving webs. Recent improvements in OAUGDP power density, plasma quality and impedance matching of the power supply to the parallel plate plasma reactor have made it possible to raise the surface energy of a variety of polymeric webs (PP, PET, PE, etc.) to levels in the range of 60 to 70 dynes/cm with one second of exposure. In most cases these high surface energies were not durable, and fell off to 50 dynes/cm after periods of weeks to months. Here, we report the exposure of nonwoven fabrics made of PP and PET at the UTK Textiles and Nonwovens Development Center (TANDEC) to an impedance matched parallel plate OAUGDP for durations ranging from one second to several tens of seconds. Data will be reported on the surface energy, wettability and wickability as functions of time of exposure, and of the aging effect after exposure. We will report the use of a OAUGDP with air as the working gas to sterilize a broad range of microorganisms on a variety of surfaces, and in several distinct applications. These include a Remote Exposure Reactor to sterilize large workpieces 20 centimeters or more from the plasma-generating region, and a sterilizable air filter.


1997 ◽  
Vol 485 ◽  
Author(s):  
B. G. Budaguan ◽  
A. A. Aivazov ◽  
M. N. Meytin ◽  
A. G. Radosel'Sky

AbstractThe perspectives for solar cell application of structural inhomogeneous a-Si:H films deposited at high growth rates (∼10–20 Å/s) from 100% SiH4 in low frequency (LF) 55kHz glow discharge plasma have been investigated. In this case the influence of structural inhomogeneity on dark dc and photoconductivities and light-induced defect generation kinetics (Staebler-Wronski effect, SWE) in a-Si:H films have been studied. The microstructure of films was investigated by IR spectroscopy analysis. Microstructural parameter R=[SiH2]/([;SiH]+[SiH2]), was used for the quantitative characterization of structural inhomogeneity in the material bulk.It was found that Fermi level position is fixed by deep defect states and does not depend on microstructure parameter R. The comparative analysis of photoconductivity modeling and ESR measurements have shown that recombination in a-Si:H films is controlled by neutral dangling bonds and doesn't depend on parameter R. Meanwhile it was found that the kinetics of light-induced defect generation was controlled by SiH2 or clustered SiH groups content. Thus, the above results allow to perform an independent control of stability and electronic properties of a-Si:H films deposited in LF glow discharge plasma.


1997 ◽  
Vol 67 (5) ◽  
pp. 359-369 ◽  
Author(s):  
Peter P. Tsai ◽  
Larry C. Wadsworth ◽  
J. Reece Roth

In industrial applications, a steady-state glow discharge capable of operating at one atmosphere would allow many plasma-related surface modification processes to be done on the production line, rather than in expensive vacuum systems that force batch processing. In this paper, we report some encouraging results from the plasma surface treatment of polypropylene meltblown nonwovens in the UTK one-atmosphere glow discharge plasma reactor. This reactor generates a large volume (up to 2.4 liters), low power (less than 150 watts), uniform glow discharge plasma in a parallel plate configuration with oval electrodes of 213 cm2 face area, the lower electrode being covered with a 3.2 mm thick insulating Pyrex surface. The plates are set up in an enclosed box that makes it possible to control the working gas used, and the spacing between the plates can be varied. This reactor is energized by a custom-made high impedance kilohertz power supply capable of supplying up to 5 kilowatts of kilohertz power at RMS voltages up to 10 kV, and over a frequency range from 1 to 100 kHz. Exposing a wide variety of polymer fabrics reveals that the wettability, wickability, printability, and surface contact angle of the materials are significantly changed in a direction that may lead to new uses for these materials.


1998 ◽  
Vol 507 ◽  
Author(s):  
B.G. Budaguan ◽  
A.A. Aivazov

ABSTRACTIn this work we have used square-wave-modulated (SQWM) low frequency (55kHz) glow discharge plasma for deposition of a-Si:H films and observed a significant stability improvement. To investigate the origin of stability improvement the relation between growth mechanism, film microstructure and metastability was analyzed. It was shown that the use of SQWM-plasma decreases the concentration and average size of inhomogeneities calculated from AFM data while photoconductivity under He-Ne laser illumination (Staebler-Wronski effects) didn't degrade during standard time of experiments. Differential scanning calorimetry (DSC) measurements were carried out and it was found that in SQWM samples hydrogen effusion occurs at higher temperatures than in cw a-Si:H which is connected with increased structural stability of films deposited in SQWM-plasma. Taking into account the high photoconductivity and low defect density of SQWM samples it is concluded that modulating of LF plasma is a perspective method for deposition of stable a-Si:H films and its alloys.


2017 ◽  
Vol 88 ◽  
pp. 225-231 ◽  
Author(s):  
M.F. Bekkara ◽  
Y. Benmimoun ◽  
A. Tilmatine ◽  
K. Miloudi ◽  
S. Flazi

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