Quantum Characterization of Si Nano-Particles Fabricated by Multi-Hollow Discharge Plasma Chemical Vapor Deposition

Science of Advanced Materials ◽

10.1166/sam.2016.2520 ◽

2016 ◽

Vol 8 (3) ◽

pp. 636-639

Author(s):

Hyunwoong Seo ◽

Giichiro Uchida ◽

Naho Itagaki ◽

Kazunori Koga ◽

Masaharu Shiratani

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Nano Particles ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Direct Current Discharge Plasma Chemical Vapor Deposition of Nanocrystalline Graphite Films on Carbon Fibers

The Journal of Physical Chemistry C ◽

10.1021/jp801615w ◽

2008 ◽

Vol 112 (29) ◽

pp. 10735-10739 ◽

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Wentao Qi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Fibers ◽

Direct Current ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Discharge ◽

Nanocrystalline Graphite

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Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

Diamond and Related Materials ◽

10.1016/j.diamond.2005.11.011 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1484-1491 ◽

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

M.P.M. Kivitorma ◽

I.J. Vayrynen ◽

T. Aoki

Keyword(s):

Chemical Vapor Deposition ◽

Surface Morphology ◽

Vapor Deposition ◽

Chemical Structure ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Growth and characterization of diamond films on TiN/Si(100) by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2008.10.018 ◽

2009 ◽

Vol 18 (2-3) ◽

pp. 124-127 ◽

Author(s):

Wei-Chun Chen ◽

Wei-Lin Wang ◽

Rajanish N. Tiwari ◽

Li Chang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Growth and Characterization of the Laterally Enlarged Single Crystal Diamond Grown by Microwave Plasma Chemical Vapor Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/35/7/078101 ◽

2018 ◽

Vol 35 (7) ◽

pp. 078101 ◽

Author(s):

Ze-Yang Ren ◽

Jin-Feng Zhang ◽

Jin-Cheng Zhang ◽

Sheng-Rui Xu ◽

Chun-Fu Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Single Crystal Diamond

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Characterization of Epitaxial Si Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Cylindrical Rotary Electrode

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.3592 ◽

2006 ◽

Vol 45 (4B) ◽

pp. 3592-3597 ◽

Author(s):

Kiyoshi Yasutake ◽

Hiromasa Ohmi ◽

Hiroaki Kakiuchi ◽

Takuya Wakamiya ◽

Heiji Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma ◽

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Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l987 ◽

1993 ◽

Vol 32 (Part 2, No. 7B) ◽

pp. L987-L989 ◽

Author(s):

Yusuke Mori ◽

Yoshiyuki Show ◽

Masahiro Deguchi ◽

Hiromasa Yagi ◽

Hiroyuki Yagyu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Electrical characterization of graphene films synthesized by low-temperature microwave plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.4825103 ◽

2013 ◽

Vol 103 (15) ◽

pp. 153106 ◽

Author(s):

Yuki Okigawa ◽

Kazuo Tsugawa ◽

Takatoshi Yamada ◽

Masatou Ishihara ◽

Masataka Hasegawa

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Microwave Plasma ◽

Electrical Characterization ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Formation and characterization of the fluorocarbonated-SiO2 films by O2/FTES-helicon plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00073-5 ◽

1999 ◽

Vol 345 (1) ◽

pp. 45-49 ◽

Author(s):

Kyoung Suk Oh ◽

Min Sung Kang ◽

Kwang-Man Lee ◽

Duk Soo Kim ◽

Chi Kyu Choi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Helicon Plasma ◽

Plasma Chemical Vapor Deposition

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Characterization of transport properties of multiwalled carbon nanotube networks by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2006.01.006 ◽

2006 ◽

Vol 15 (4-8) ◽

pp. 1138-1142 ◽

Author(s):

Yasuhiko Hayashi ◽

T. Tokunaga ◽

K. Kaneko ◽

Z. Horita

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Multiwalled Carbon ◽

Plasma Chemical Vapor Deposition ◽

Carbon Nanotube Networks

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Characterization of hard transparent B–C–N–H thin films formed by plasma chemical‐vapor deposition at room temperature

Journal of Applied Physics ◽

10.1063/1.335826 ◽

1985 ◽

Vol 58 (8) ◽

pp. 3185-3189 ◽

Author(s):

Kadry Montasser ◽

S. Hattori ◽

S. Morita

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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