Hall Effect Measurements to Characterize the Effect of Precursor Composition and Annealing Atmosphere on Solution-Processed CuInSe2 Absorbers

Author(s):  
Kyle G. Weideman ◽  
Swapnil D. Deshmukh ◽  
Rakesh Agrawal
2011 ◽  
Vol 107 (6) ◽  
Author(s):  
Jui-Fen Chang ◽  
Tomo Sakanoue ◽  
Yoann Olivier ◽  
Takafumi Uemura ◽  
Marie-Beatrice Dufourg-Madec ◽  
...  

2018 ◽  
Vol 31 (3) ◽  
pp. 20
Author(s):  
Sarmad M. M. Ali ◽  
Alia A.A. Shehab ◽  
Samir A. Maki

In this study, the ZnTe thin films were deposited on a glass substrate at a thickness of 400nm using vacuum evaporation technique (2×10-5mbar) at RT. Electrical conductivity and Hall effect measurements have been investigated as a function of variation of the doping ratios (3,5,7%) of the Cu element on the thin ZnTe films. The temperature range of (25-200°C) is to record the electrical conductivity values. The results of the films have two types of transport mechanisms of free carriers with two values of activation energy (Ea1, Ea2), expect 3% Cu. The activation energy (Ea1) increased from 29meV to 157meV before and after doping (Cu at 5%) respectively. The results of Hall effect measurements of ZnTe , ZnTe:Cu films show that all films were (p-type), the carrier concentration (1.1×1020 m-3) , Hall mobility (0.464m2/V.s) for pure ZnTe film, increases the carrier concentration (6.3×1021m-3) Hall mobility (2m2/V.s) for doping (Cu at 3%) film, but  decreases by increasing Cu concentration.


2015 ◽  
Vol 212 (7) ◽  
pp. 1487-1493 ◽  
Author(s):  
Woong-Jhae Lee ◽  
Hyung Joon Kim ◽  
Egon Sohn ◽  
Hoon Min Kim ◽  
Tai Hoon Kim ◽  
...  

1997 ◽  
Vol 79 (21) ◽  
pp. 4246-4249 ◽  
Author(s):  
D. R. Leadley ◽  
R. J. Nicholas ◽  
D. K. Maude ◽  
A. N. Utjuzh ◽  
J. C. Portal ◽  
...  

2008 ◽  
Vol 38 (1) ◽  
pp. 147-155 ◽  
Author(s):  
C. A. C. Sequeira ◽  
D. M. F. Santos

1999 ◽  
Vol 14 (7) ◽  
pp. 2778-2782 ◽  
Author(s):  
M. S. Han ◽  
T. W. Kang ◽  
T. W. Kim

Transmission electron microsopy (TEM), Hall effect, and Fourier transform infrared (FTIR) transmission measurements were performed to investigate the structural, electrical, and optical properties of indium-doped Hg0.8Cd0.2Te epitaxial layers grown on Cd0.96Zn0.04Te (211) B substrates by molecular-beam epitaxy. The TEM measurements showed that high-quality Hg0.8Cd0.2Te epitaxial layers with interfacial abruptnesses were grown on the Cd0.96Zn0.04Te substrates. The Van der Pauw Hall effect measurements on typical indium-doped Hg0.8Cd0.2Te/Cd0.96Zn0.04Te heterostructures with a doping concentration of 6 × 1016 cm−3 at 10 K in a magnetic field of 0.5 T yielded a carrier density and a mobility of 2.2 × 1016 cm−3 and 40,000 cm2/V s, respectively. The FTIR spectra showed that the absorption edges of the indium-doped Hg0.8Cd0.2Te/Cd0.96Zn0.04Te heterostructures shifted to a shorter wavelength range than those of the undoped samples, which was caused by the Burstein–Moss effect. The FTIR spectra also showed that the transmittance intensities of the indium-doped Hg0.8Cd0.2Te/Cd0.96Zn0.04Te heterostructures increased compared with those of the undoped heterostructures, which is due to the compensation of the Hg vacancy defects by the indium atoms. These results indicate that the indium-doped Hg0.8Cd0.2Te epitaxial layers were high-quality n-type layers and that p-HgxCd1−xTe epilayers can be grown on indium-doped Hg0.8Cd0.2Te/Cd0.96Zn0.04Te heterostructures for the fabrication of HgxCd1−xTe photoconductors and photodiodes.


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