Holographic lithography for grating coupler fabrication in gallium nitride grown on sapphire substrate

Author(s):  
R. Dylewicz ◽  
S. Patela ◽  
R. Paszkiewicz ◽  
M. Tlaczala ◽  
S. Bartkiewicz ◽  
...  
2005 ◽  
Author(s):  
R. Dylewicz ◽  
S. Patela ◽  
R. Paszkiewicz ◽  
M. Tlaczala ◽  
S. Bartkiewicz ◽  
...  

2009 ◽  
Vol 476 (1-2) ◽  
pp. 629-634 ◽  
Author(s):  
Dongsheng Peng ◽  
Yuchun Feng ◽  
Hanben Niu

1992 ◽  
Vol 280 ◽  
Author(s):  
A. Estes Wickenden ◽  
D. K. Wickenden ◽  
T. J. Kistenmacher ◽  
S. A. Ecelberger ◽  
T. O. Poehler

ABSTRACTNucleation layers of GaN have been deposited in an MOCVD reactor on (0001) sapphire, over a range of temperatures and layer thicknesses, using either N2 or H2 carrier gas. The layers have been found to be continuous, textured films as deposited at low temperatures (600°C), but to reorder upon annealing, segregating into nucleation sites which exhibit the normal heteroepitaxial relationship with the sapphire substrate.


2005 ◽  
Vol 41 (1) ◽  
pp. 46 ◽  
Author(s):  
M. Werquin ◽  
C. Gaquiére ◽  
Y. Guhel ◽  
N. Vellas ◽  
D. Theron ◽  
...  

2012 ◽  
Vol 101 (15) ◽  
pp. 151103 ◽  
Author(s):  
Jinn-Kong Sheu ◽  
Shang-Ju Tu ◽  
Yu-Hsiang Yeh ◽  
Ming-Lun Lee ◽  
Wei-Chih Lai

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