Formation of hafnium-aluminum-oxide gate dielectric using single cocktail liquid source in MOCVD process
2003 ◽
Vol 50
(10)
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pp. 2088-2094
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2008 ◽
Vol 205
(3)
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pp. 626-632
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2004 ◽
Vol 51
(11)
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pp. 1877-1882
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Keyword(s):
2014 ◽
Vol 6
(22)
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pp. 19592-19599
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2013 ◽
Vol 28
(11)
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pp. 115003
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Keyword(s):
Keyword(s):