Formation of hafnium-aluminum-oxide gate dielectric using single cocktail liquid source in MOCVD process

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Byung Jin Cho ◽  
Chia Ching Yeo ◽  
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Sung Jin Whoang ◽  
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Christophe Avis ◽  
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Undecomposed ethylene glycol residuals in solution processed aluminum oxide gate dielectric result in the frequency-dependent capacitance.


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