Full-Band Tunneling in High-$\kappa$ Oxide MOS Structures

2007 ◽  
Vol 54 (12) ◽  
pp. 3168-3176 ◽  
Author(s):  
Fabio Sacconi ◽  
Jean Marc Jancu ◽  
Michael Povolotskyi ◽  
Aldo Di Carlo
Keyword(s):  
2004 ◽  
Vol 48 (4) ◽  
pp. 575-580 ◽  
Author(s):  
Fabio Sacconi ◽  
Michael Povolotskyi ◽  
Aldo Di Carlo ◽  
Paolo Lugli ◽  
Martin Städele

2002 ◽  
Vol 314 (1-4) ◽  
pp. 345-349 ◽  
Author(s):  
Fabio Sacconi ◽  
Michael Povolotskyi ◽  
Aldo Di Carlo ◽  
Paolo Lugli ◽  
Martin Städele ◽  
...  

2004 ◽  
Vol 51 (5) ◽  
pp. 741-748 ◽  
Author(s):  
F. Sacconi ◽  
A. Di Carlo ◽  
P. Lugli ◽  
M. Stadele ◽  
J.-M. Jancu
Keyword(s):  

2007 ◽  
Vol 47 (4-5) ◽  
pp. 694-696 ◽  
Author(s):  
F. Sacconi ◽  
J.M. Jancu ◽  
M. Povolotskyi ◽  
A. Di Carlo
Keyword(s):  

2003 ◽  
Vol 2 (2-4) ◽  
pp. 439-442
Author(s):  
F. Sacconi ◽  
A. Di Carlo ◽  
P. Lugli ◽  
M. Städele

VLSI Design ◽  
2001 ◽  
Vol 13 (1-4) ◽  
pp. 125-129
Author(s):  
S. J. Wigger ◽  
S. M. Goodnick ◽  
M. Saraniti

We report on the 2D and 3D modeling of ultra-small MOS structures using a newly developed full-band device simulator. The simulation tool is based on a novel approach, featuring a hybrid Ensemble Monte Carlo (EMC)-Cellular Automata (CA) simulation engine. In this hybrid approach charge transport is simulated using the CA in regions of momentum space where most scattering events occur and the EMC elsewhere, thus optimizing the trade-off between the fast, but memory consuming CA method and the slower EMC method. To account for the spatial distribution of the electric field and charge concentration, the hybrid EMC/CA simulator is self-consistently coupled with a 2D and 3D multi-grid Poisson solver. The solver is then used to simulate the performance of a 40 nm gate length n-MOSFET structure.


2020 ◽  
Vol 67 (12) ◽  
pp. 5662-5668
Author(s):  
Adel M'foukh ◽  
Marco G. Pala ◽  
David Esseni

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