scholarly journals Effect of heat treatment on the surface chemical structure of glass: Oxygen speciation from in situ XPS analysis

2017 ◽  
Vol 101 (2) ◽  
pp. 644-656 ◽  
Author(s):  
Joy Banerjee ◽  
Vincent Bojan ◽  
Carlo G. Pantano ◽  
Seong H. Kim
Keyword(s):  
Heat Treatment ◽  
Chemical Structure ◽  
Xps Analysis ◽  
Surface Chemical ◽  
In Situ Xps

In situ XPS analysis of the electronic structure of silicon and titanium thin films exposed to low-pressure inductively-coupled RF plasma

2021 ◽  
Vol 542 ◽  
pp. 148684
Author(s):  
Jordi Fraxedas ◽  
Max Schütte ◽  
Guillaume Sauthier ◽  
Massimo Tallarida ◽  
Salvador Ferrer ◽  
...  
Keyword(s):  
Thin Films ◽  
Electronic Structure ◽  
Low Pressure ◽  
Rf Plasma ◽  
Xps Analysis ◽  
Inductively Coupled ◽  
In Situ Xps ◽  
Titanium Thin Films

Initial oxidation of U3Si2 studied by in-situ XPS analysis

2019 ◽  
Vol 520 ◽  
pp. 1-5 ◽  
Author(s):  
Tingwen Yan ◽  
Donghua Xie ◽  
Zhilei Chen ◽  
Ruilong Yang ◽  
Kangwei Zhu ◽  
...  
Keyword(s):  
Xps Analysis ◽  
Initial Oxidation ◽  
In Situ Xps

In situ XPS analysis of the tungsten/sublayer interface after SF6 based reactive ion etching

1993 ◽  
Vol 70-71 ◽  
pp. 613-618 ◽  
Author(s):  
N. Couchman ◽  
C. Pacifico ◽  
G. Turban ◽  
B. Grolleau
Keyword(s):  
Reactive Ion Etching ◽  
Xps Analysis ◽  
Ion Etching ◽  
In Situ Xps

ToF-SIMS and XPS analysis of the surface chemical structure of some linear poly(orthoesters)

1991 ◽  
Vol 24 (20) ◽  
pp. 5508-5514 ◽  
Author(s):  
M. C. Davies ◽  
R. A. P. Lynn ◽  
J. F. Watts ◽  
A. J. Paul ◽  
J. C. Vickerman ◽  
...  
Keyword(s):  
Chemical Structure ◽  
Xps Analysis ◽  
Surface Chemical ◽  
Tof Sims ◽  
Linear Poly

In situ AP-XPS analysis of a Pt thin-film sensor for highly sensitive H2 detection

2020 ◽  
Vol 56 (70) ◽  
pp. 10147-10150
Author(s):  
Ryo Toyoshima ◽  
Takahisa Tanaka ◽  
Taro Kato ◽  
Ken Uchida ◽  
Hiroshi Kondoh
Keyword(s):  
Thin Film ◽  
Working Conditions ◽  
Chemical State ◽  
Xps Analysis ◽  
Surface Chemical ◽  
Film Sensor ◽  
Thin Film Sensor ◽  
Highly Sensitive ◽  
Surface Chemical State

Changes in surface chemical state of a resistivity-based Pt thin-film sensor for H2 gas were observed under working conditions with direct in situ spectroscopy.

Catalyst free growth of high density uniform InN nanocolumns on p-GaAs(001) surface by PA-MBE and their in situ XPS analysis

2015 ◽  
Vol 331 ◽  
pp. 248-253 ◽  
Author(s):  
Qiang Jing ◽  
Hang Yang ◽  
Wancheng Li ◽  
Guoguang Wu ◽  
Yuantao Zhang ◽  
...  
Keyword(s):  
High Density ◽  
Xps Analysis ◽  
Catalyst Free ◽  
In Situ Xps ◽  
Free Growth

The Role of Barium In the Heteroepitaxial Growth of Insulator and Semiconductors On Silicon

1993 ◽  
Vol 334 ◽  
Author(s):  
T. K. Chu ◽  
F. Santiago ◽  
M. Stumborg ◽  
C. A. Huber
Keyword(s):  
Epitaxial Growth ◽  
Chemical Reactions ◽  
Surface Chemical ◽  
Metallic Elements ◽  
Heteroepitaxial Growth ◽  
Si Substrates ◽  
In Situ Xps ◽  
Surface Chemical Reactions

AbstractThe epitaxial growth of an insulator, BaF2, and semiconductors of the II-VI and the IV-VI families on Si substrates were carried out. In-situ XPS analyses during the growth of the first monolayers were used to study the surface chemical reactions involved. The results point to a common ingredient in these growths: that the Ba atoms are involved in forming interfacial compounds that would facilitate the heteroepitaxies. In the case of BaF2/Si, a BaSi2 compound has been identified previously. In the case of PbTe and CdTe, the heteroepitaxies on Si are made possible with the BaSi2 buffer. As a result, the impinging semiconductor molecules are broken up, and the metallic elements are ejected from the BaSi2 surface. A new surface chemical, BaTe, is thereby formed. These surface Ba compounds appear to be the dominant factors as the crystal orientations of the BaF2, CdTe, and PbTe layers are independent of those of the Si substrates.

In-situ XPS analysis of oxidized and reduced plasma deposited ruthenium-based thin catalytic films

2017 ◽  
Vol 426 ◽  
pp. 852-855 ◽  
Author(s):  
Jacek Balcerzak ◽  
Wiktor Redzynia ◽  
Jacek Tyczkowski
Keyword(s):  
Xps Analysis ◽  
In Situ Xps
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