In situ XPS analysis of the tungsten/sublayer interface after SF6 based reactive ion etching

1993 ◽  
Vol 70-71 ◽  
pp. 613-618 ◽  
Author(s):  
N. Couchman ◽  
C. Pacifico ◽  
G. Turban ◽  
B. Grolleau
Keyword(s):  
Reactive Ion Etching ◽  
Xps Analysis ◽  
Ion Etching ◽  
In Situ Xps

In situ XPS analysis of the electronic structure of silicon and titanium thin films exposed to low-pressure inductively-coupled RF plasma

2021 ◽  
Vol 542 ◽  
pp. 148684
Author(s):  
Jordi Fraxedas ◽  
Max Schütte ◽  
Guillaume Sauthier ◽  
Massimo Tallarida ◽  
Salvador Ferrer ◽  
...  
Keyword(s):  
Thin Films ◽  
Electronic Structure ◽  
Low Pressure ◽  
Rf Plasma ◽  
Xps Analysis ◽  
Inductively Coupled ◽  
In Situ Xps ◽  
Titanium Thin Films

scholarly journals Effect of heat treatment on the surface chemical structure of glass: Oxygen speciation from in situ XPS analysis

2017 ◽  
Vol 101 (2) ◽  
pp. 644-656 ◽  
Author(s):  
Joy Banerjee ◽  
Vincent Bojan ◽  
Carlo G. Pantano ◽  
Seong H. Kim
Keyword(s):  
Heat Treatment ◽  
Chemical Structure ◽  
Xps Analysis ◽  
Surface Chemical ◽  
In Situ Xps

Initial oxidation of U3Si2 studied by in-situ XPS analysis

2019 ◽  
Vol 520 ◽  
pp. 1-5 ◽  
Author(s):  
Tingwen Yan ◽  
Donghua Xie ◽  
Zhilei Chen ◽  
Ruilong Yang ◽  
Kangwei Zhu ◽  
...  
Keyword(s):  
Xps Analysis ◽  
Initial Oxidation ◽  
In Situ Xps

Anisotropic Reactive Ion Etching of MoSi2 and In Situ Doped n+ and p+ Polysilicon Using Cl2 and BCl3

1988 ◽  
Vol 135 (9) ◽  
pp. 2373-2378 ◽  
Author(s):  
T. C. Mele ◽  
S. C. Arney ◽  
J. P. Krusius ◽  
N. C. MacDonald
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching
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