Frictional Characteristics of Mesoporous SiO2 Thin Film Formed by Sol-Gel and Self-Assembly Method

2007 ◽  
Author(s):  
Yun-Ha Shin ◽  
Hong-Gyu Jeon ◽  
Jeong-Kuk Son ◽  
Ji-Man Kim ◽  
Tae-Sung Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Pore Size ◽  
Self Assembly ◽  
Sol Gel ◽  
Wear Particle ◽  
Porous Films ◽  
Sio2 Thin Film ◽  
Assembly Method ◽  
Glass Specimen ◽  
Mesoporous Sio2

Frictional characteristics of mesoporous SiO2 thin films were evaluated with different pore sizes. The films were manufactured by sol-gel and self-assembly methods to have a porous structure. The pores on the surface may play as the outlet of wear particle and the storage of lubricant so that the surface interactions could be improved. The pores were exposed on the surface by chemical mechanical polishing (CMP) or plasma-etching after forming the porous films. The ball-on-disk tests with mesoporous SiO2 thin films on glass specimen were conducted at sliding speed of 15rpm and a load of 0.26N. The results show considerable dependency of friction on pore size of mesoporous SiO2 thin films. The friction coefficient decreased as increasing the pore size. CMP process was very useful to expose the pores on the surface.

On the mechanical and electrical properties of self-assembly-based organosilicate porous films

2017 ◽  
Vol 5 (33) ◽  
pp. 8599-8607 ◽  
Author(s):  
M. Redzheb ◽  
S. Armini ◽  
T. Berger ◽  
M. Jacobs ◽  
M. Krishtab ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Self Assembly ◽  
Sol Gel ◽  
Porous Films ◽  
Mechanical And Electrical Properties

The effect of the replacement of Si–O–Si by Si–CH2–Si groups on the mechanical and electrical properties of silica-based hybrid sol–gel thin films is reported.

Different Adsorption States between Thiophene and α-Bithiophene Thin Films Prepared by Self-Assembly Method

2003 ◽  
Vol 42 (Part 2, No. 7B) ◽  
pp. L852-L855 ◽  
Author(s):  
Eisuke Ito ◽  
Jaegeun Noh ◽  
Masahiko Hara
Keyword(s):  
Thin Films ◽  
Self Assembly ◽  
Assembly Method

Electrical, Mechanical, and Structural Properties of Fluoro-Containing Poly(silsesquioxanes) Based Porous Low k Thin Films

2003 ◽  
Vol 766 ◽  
Author(s):  
Jingyu Hyeon-Lee ◽  
Jihoon Rhee ◽  
Jungbae Kim ◽  
Jin-Heong Yim ◽  
Seok Chang
Keyword(s):  
Thin Films ◽  
Pore Size ◽  
Dielectric Constants ◽  
Commercial Application ◽  
Porous Films ◽  
Low Dielectric ◽  
Nanoporous Films ◽  
Positronium Annihilation ◽  
Positronium Annihilation Lifetime Spectroscopy ◽  
Low K

AbstractLow dielectric fluoro-containing poly(silsesquioxanes) (PSSQs) have been synthesized using trifluoropropyl trimethoxysilane (TFPTMS), methyl trimethoxysilane (MTMS), and 2, 4, 6, 8-tetramethyl-2, 4, 6, 8-tetra(trimethoxysilylethyl) cyclotetrasiloxane. The properties of fluorocontaining PSSQs based thin films were studied by electrical, mechanical, and structural characterization. Film was spun on a silicon substrate, baked at 150°C and 250°C for 1 minute, respectively, and cured in the furnace at 420°C for 1 hour under vacuum condition. Thermally decomposable trifluoropropyl groups of the fluoro-containing PSSQ were served as a pore generator and partially contributed to lower a dielectric constant. â-cyclodextrin (CD) was also employed as a pore generator. The concentration of the pore generator in the film was varied from 0 to 30 %. The dielectric constants of the porous PSSQ films were found to be in the range of 2.7 – 1.9 (at 100 kHz). Hardness and Young's modulus of the films were measured by nano-indentation. The elastic modulus and hardness of the porous films were well correlated with the concentration of the pore generators. Positronium Annihilation Lifetime Spectroscopy (PALS) was employed to characterize a pore size of the porous fluoro-containing PSSQ film. The pore size of the film was less than 2.2 nm. The nanoporous films showed quite promising properties for commercial application.

Functionalization of Polysulfonamide (PSA) Fabrics with Al(OH)3 Thin Films by Electrostatic Self-Assembly Method

2013 ◽  
Vol 52 (10) ◽  
pp. 3607-3612 ◽  
Author(s):  
Linping Zhang ◽  
Yingying Jiang ◽  
Hui Ma ◽  
Xiaoyan Zhang ◽  
Hong Xu ◽  
...  
Keyword(s):  
Thin Films ◽  
Self Assembly ◽  
Assembly Method

Facile synthesis of mesoporous ZnAl2O4 thin films through the evaporation-induced self-assembly method

2009 ◽  
Vol 488 (1) ◽  
pp. 320-324 ◽  
Author(s):  
Xiqiang Tian ◽  
Lijuan Wan ◽  
Kai Pan ◽  
Chungui Tian ◽  
Honggang Fu ◽  
...  
Keyword(s):  
Thin Films ◽  
Self Assembly ◽  
Facile Synthesis ◽  
Assembly Method ◽  
Evaporation Induced Self Assembly

Fabrication of two-dimensional layered perovskite [NH3(CH2)12NH3]PbX4 thin films using a self-assembly method

2002 ◽  
pp. 1094-1095 ◽  
Author(s):  
Takashi Matsui ◽  
Akane Yamaguchi ◽  
Yuko Takeoka ◽  
Masahiro Rikukawa ◽  
Kohei Sanui
Keyword(s):  
Thin Films ◽  
Self Assembly ◽  
Layered Perovskite ◽  
Two Dimensional ◽  
Assembly Method

Framework Functionalization of Periodic Mesoporous Organosilica with 1,2-bis[3-(triethoxysilylpropyl)ureido] cyclohexane Function via Basic Co-condensation Self-Assembly

2008 ◽  
Vol 8 (7) ◽  
pp. 3532-3538 ◽  
Author(s):  
M. Abdul Wahab ◽  
I. Kim ◽  
C. S. Ha
Keyword(s):  
Pore Size ◽  
Self Assembly ◽  
Pore Wall ◽  
Periodic Mesoporous Organosilica ◽  
Assembly Method ◽  
Pore Size Distributions ◽  
Bet Analysis ◽  
Diffraction Patterns ◽  
Covalently Linked ◽  
Mesoporous Organosilicas

The synthesized bis silylated long alkyl chain containing organosilicate precursor, 1,2-bis(3-(triethoxysilylpropyl)ureido)cyclohexane (BSPUCh) has been used as co-precursor with 1,2-bis (triethoxysilyl)ethane (BTSE) for the preparation of functional periodic mesoporous organosilicas (PMOs) via surfactant-mediated basic co-condensation self-assembly method. The various characterization techniques such as X-ray diffraction patterns (XRD), transmission electron microscope (TEM), N2 adsorption–desorption isotherms (BET), FT-IR, and 13C and 29Si CPMAS NMR spectroscopies were used to characterize the resulting structure of functionalized PMO mesostructures. Results obtained from XRD, TEM, and BET analysis clearly showed that the structural and pore arrangement of the functionalized PMOs were found to be dependent on the used concentration of BSPUCh. The functional PMOs showed well ordered mesophases when BSPUCh concentration was ≤9 wt% in the initial mixtures, whereas higher concentration of the BSPUCh always produced disordered hierarchical mesostructures with bimodal pore size distributions. The incorporation of BSPUCh also reduces the surface area, pore volume, pore size, and pore wall thickness of the functionalized nanostructures, indicating that the BSPUCh is incorporated in the pore channels of the PMOs. The solid-state 13C and 29Si NMR spectra showed that the BSPUCh organosilicate with non-hydrolyzable bridging ligands propylureidocyclohexane has been successfully covalently linked in the framework of the resulting functional PMOs.

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