Control of Adiabatic Liquid/Vapor Flow Utilizing EHD Conduction Pumping Mechanism
Unlike the electrohydrodynamic (EHD) induction and iondrag pumping, the conduction pumping is associated with the heterocharge layers of finite thickness in the vicinity of the electrodes which are based on the process of dissociation of the neutral electrolytic species and recombination of the generated ions. The conduction term here represents a mechanism for electric current flow in which charged carriers are produced not by injection from electrodes, but by dissociation of molecules within the fluid. This paper presents the control of adiabatic two-phase (liquid/vapor) flow distribution with EHD conduction pumping mechanism at two mass flux levels, Gtotal = 50 kg/m2s and Gtotal = 100 kg/m2s. The effects of the vapor quality, ranging from 0 to 26%, on the EHD conduction pumping have also been experimentally investigated. The measured pressure data show that the EHD conduction pumping can significantly decrease the pressure drop of the two-phase flow. It is also found that the performances of the EHD conduction pump are related to the mass flux and quality of two-phase flow.