Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1641049 ◽

2004 ◽

Vol 22 (2) ◽

pp. 260-263 ◽

Author(s):

Jung W. Lee ◽

Jerome J. Cuomo ◽

Mohamed Bourham

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Plasma Characteristics ◽

Pulsed Direct Current

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Optimization on Deposition of Aluminum Nitride by Pulsed Direct Current Reactive Magnetron Sputtering

2020 China Semiconductor Technology International Conference (CSTIC) ◽

10.1109/cstic49141.2020.9282480 ◽

2020 ◽

Author(s):

Yu-Pu Yang ◽

Te-Yun Lu ◽

Song-Ho Wang ◽

Hsueh-Er Chang ◽

Peter j. Wang ◽

...

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Pulsed Direct Current

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Surface metallic state of aluminum-nitride (AlN) thin films prepared by direct current (DC)-reactive magnetron sputtering: optical spectroscopic analysis with incoherent light

Scripta Materialia ◽

10.1016/j.scriptamat.2003.11.034 ◽

2004 ◽

Vol 50 (5) ◽

pp. 589-592 ◽

Author(s):

Nikifor Rakov ◽

Arshad Mahmood ◽

Mufei Xiao

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Direct Current ◽

Spectroscopic Analysis ◽

Reactive Magnetron Sputtering ◽

Metallic State ◽

Reactive Magnetron ◽

Incoherent Light ◽

Dc Reactive Magnetron Sputtering

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Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582059 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3317-3321 ◽

Author(s):

V. Vancoppenolle ◽

P.-Y. Jouan ◽

M. Wautelet ◽

J.-P. Dauchot ◽

M. Hecq

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Glow Discharge Mass Spectrometry ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

Mass Spectrometry Study

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Overgrowth of indium nitride thin films on aluminum nitride nucleated (00.1) sapphire by reactive magnetron sputtering

Applied Physics Letters ◽

10.1063/1.106190 ◽

1991 ◽

Vol 59 (15) ◽

pp. 1844-1846 ◽

Author(s):

Thomas J. Kistenmacher ◽

Wayne A. Bryden

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Indium Nitride ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Structural and ferroelectric properties of bismuth ferrite thin films deposited by direct current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2015.10.035 ◽

2016 ◽

Vol 601 ◽

pp. 106-110 ◽

Author(s):

Aleksandras Iljinas ◽

Vytautas Stankus

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Bismuth Ferrite ◽

Ferroelectric Properties ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Ferrite Thin Films

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Influence of deposition conditions on optical properties of aluminum nitride (AlN) thin films prepared by DC-reactive magnetron sputtering

Materials Letters ◽

10.1016/s0167-577x(02)01106-0 ◽

2003 ◽

Vol 57 (13-14) ◽

pp. 1925-1933 ◽

Author(s):

Arshad Mahmood ◽

Nikifor Rakov ◽

Mufei Xiao

Keyword(s):

Optical Properties ◽

Aluminum Nitride ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering ◽

Deposition Conditions

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Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films

Thin Solid Films ◽

10.1016/j.tsf.2004.06.159 ◽

2005 ◽

Vol 473 (1) ◽

pp. 58-62 ◽

Author(s):

Ruijin Hong ◽

Hongji Qi ◽

Jianbing Huang ◽

Hongbo He ◽

Zhengxiu Fan ◽

...

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Zno Thin Films ◽

Reactive Magnetron

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Influence of sputtering parameters and nitrogen on the microstructure of chromium nitride thin films deposited on steel substrate by direct-current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2010.05.095 ◽

2010 ◽

Vol 518 (20) ◽

pp. 5762-5768 ◽

Author(s):

Hetal N. Shah ◽

R. Jayaganthan ◽

Davinder Kaur ◽

Ramesh Chandra

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Steel Substrate ◽

Reactive Magnetron Sputtering ◽

Chromium Nitride ◽

Reactive Magnetron

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Optical and structural characterization of Tm2O3, TmN, and TmOxNy thin films grown by direct-current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2020.138450 ◽

2021 ◽

Vol 717 ◽

pp. 138450

Author(s):

Axel Meeuwissen ◽

Giacomo B.F. Bosco ◽

Erik van der Kolk

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Structural Characterization ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Microstructure and hydrogen impermeability of titanium nitride thin films deposited by direct current reactive magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2016.06.278 ◽

2016 ◽

Vol 688 ◽

pp. 44-50 ◽

Author(s):

Tong Zhou ◽

Dawei Liu ◽

Ying Zhang ◽

Taoyuan Ouyang ◽

Jinping Suo

Keyword(s):

Magnetron Sputtering ◽

Titanium Nitride ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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