Optical and structural characterization of Tm2O3, TmN, and TmOxNy thin films grown by direct-current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2020.138450 ◽

2021 ◽

Vol 717 ◽

pp. 138450

Author(s):

Axel Meeuwissen ◽

Giacomo B.F. Bosco ◽

Erik van der Kolk

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Structural Characterization ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Preparation and characterization of Nickel Oxide thin films by direct current reactive magnetron sputtering at different substrate temperatures

Electronic Materials Letters ◽

10.1007/s13391-014-2181-3 ◽

2014 ◽

Vol 10 (5) ◽

pp. 887-892 ◽

Cited By ~ 7

Author(s):

A. Mallikarjuna Reddy ◽

Chang Woo Byun ◽

Seung Ki Joo ◽

A. Sivasankar Reddy ◽

P. Sreedhara Reddy

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Nickel Oxide ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Substrate Temperatures ◽

Nickel Oxide Thin Films

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Growth and Characterization of Tungsten Oxide Thin Films using the Reactive Magnetron Sputtering System

Journal of Inorganic and Organometallic Polymers and Materials ◽

10.1007/s10904-016-0380-0 ◽

2016 ◽

Vol 26 (4) ◽

pp. 889-894 ◽

Cited By ~ 8

Author(s):

S. Firoozbakht ◽

E. Akbarnejad ◽

A. Salar Elahi ◽

M. Ghoranneviss

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Tungsten Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Tungsten Oxide Thin Films ◽

Sputtering System

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Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering

Solid State Sciences ◽

10.1016/j.solidstatesciences.2010.11.019 ◽

2011 ◽

Vol 13 (2) ◽

pp. 314-320 ◽

Cited By ~ 21

Author(s):

A. Mallikarjuna Reddy ◽

A. Sivasankar Reddy ◽

Kee-Sun Lee ◽

P. Sreedhara Reddy

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering

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Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582059 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3317-3321 ◽

Cited By ~ 36

Author(s):

V. Vancoppenolle ◽

P.-Y. Jouan ◽

M. Wautelet ◽

J.-P. Dauchot ◽

M. Hecq

Keyword(s):

Mass Spectrometry ◽

Thin Films ◽

Glow Discharge ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Glow Discharge Mass Spectrometry ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

Mass Spectrometry Study

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Synthesis and characterization of single-phase epitaxial Cr2N thin films by reactive magnetron sputtering

Journal of Materials Science ◽

10.1007/s10853-018-2914-z ◽

2018 ◽

Vol 54 (2) ◽

pp. 1434-1442 ◽

Cited By ~ 2

Author(s):

M. A. Gharavi ◽

G. Greczynski ◽

F. Eriksson ◽

J. Lu ◽

B. Balke ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Single Phase ◽

Reactive Magnetron Sputtering ◽

Synthesis And Characterization ◽

Reactive Magnetron

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Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2009.06.030 ◽

2009 ◽

Vol 518 (1) ◽

pp. 77-83 ◽

Cited By ~ 13

Author(s):

Matthias Krause ◽

Laurent Bedel ◽

Anthony Taupeau ◽

Ulrich Kreissig ◽

Frans Munnik ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Mechanical Characterization ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Structural and ferroelectric properties of bismuth ferrite thin films deposited by direct current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2015.10.035 ◽

2016 ◽

Vol 601 ◽

pp. 106-110 ◽

Cited By ~ 5

Author(s):

Aleksandras Iljinas ◽

Vytautas Stankus

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Bismuth Ferrite ◽

Ferroelectric Properties ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Ferrite Thin Films

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Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films

Thin Solid Films ◽

10.1016/j.tsf.2004.06.159 ◽

2005 ◽

Vol 473 (1) ◽

pp. 58-62 ◽

Cited By ~ 110

Author(s):

Ruijin Hong ◽

Hongji Qi ◽

Jianbing Huang ◽

Hongbo He ◽

Zhengxiu Fan ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Zno Thin Films ◽

Reactive Magnetron

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Influence of sputtering parameters and nitrogen on the microstructure of chromium nitride thin films deposited on steel substrate by direct-current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2010.05.095 ◽

2010 ◽

Vol 518 (20) ◽

pp. 5762-5768 ◽

Cited By ~ 31

Author(s):

Hetal N. Shah ◽

R. Jayaganthan ◽

Davinder Kaur ◽

Ramesh Chandra

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Steel Substrate ◽

Reactive Magnetron Sputtering ◽

Chromium Nitride ◽

Reactive Magnetron

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Surface characterization of TiO2 thin films obtained by high-energy reactive magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2008.01.017 ◽

2008 ◽

Vol 254 (14) ◽

pp. 4396-4400 ◽

Cited By ~ 38

Author(s):

R. Wasielewski ◽

J. Domaradzki ◽

D. Wojcieszak ◽

D. Kaczmarek ◽

A. Borkowska ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Surface Characterization ◽

High Energy ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tio2 Thin Films

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