Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films

2005 ◽  
Vol 473 (1) ◽  
pp. 58-62 ◽  
Author(s):  
Ruijin Hong ◽  
Hongji Qi ◽  
Jianbing Huang ◽  
Hongbo He ◽  
Zhengxiu Fan ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Direct Current ◽  
Reactive Magnetron Sputtering ◽  
Zno Thin Films ◽  
Reactive Magnetron

scholarly journals Surface Properties of Nanostructured, Porous ZnO Thin Films Prepared by Direct Current Reactive Magnetron Sputtering

Materials ◽  
2018 ◽  
Vol 11 (1) ◽  
pp. 131 ◽  
Author(s):  
Monika Kwoka ◽  
Barbara Lyson-Sypien ◽  
Anna Kulis ◽  
Monika Maslyk ◽  
Michal Borysiewicz ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Surface Properties ◽  
Direct Current ◽  
Reactive Magnetron Sputtering ◽  
Zno Thin Films ◽  
Reactive Magnetron

Properties of Vanadium Oxide Films Prepared by DC Reactive Magnetron Sputtering at Different Oxygen Partial Pressures

2012 ◽  
Vol 538-541 ◽  
pp. 105-109 ◽  
Author(s):  
Ren Gui Huang ◽  
Dong Ping Zhang ◽  
Ting Zhang ◽  
Yan Li ◽  
You Tong Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Vanadium Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Dc Reactive Magnetron Sputtering ◽  
Vanadium Oxide Thin Films

Due to their unique physical and chemical properties, vanadium oxide thin films have become a hot research topic. In the present work, Vanadium oxide thin films were prepared by DC reactive magnetron sputtering at different oxygen partial pressure and thermally annealed in Ar atmosphere at 500°C for 2 hours. The microstructure, transmittance, optical band gap, resistivity, and temperature coefficient resistance (TCR) were measured. The results suggest that increasing of oxygen partial pressure can obviously improve the optical and electric properties

Temperature-dependent growth and properties of W-doped ZnO thin films deposited by reactive magnetron sputtering

2013 ◽  
Vol 274 ◽  
pp. 371-377 ◽  
Author(s):  
Chi Zhang ◽  
Xin-liang Chen ◽  
Xin-hua Geng ◽  
Cong-sheng Tian ◽  
Qian Huang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Zno Thin Films ◽  
Reactive Magnetron ◽  
Temperature Dependent ◽  
Doped Zno ◽  
Dependent Growth
Sign in / Sign up

Export Citation Format

Share Document