Structural and ferroelectric properties of bismuth ferrite thin films deposited by direct current reactive magnetron sputtering

Reactive Magnetron ◽

Ferrite Thin Films

Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582059 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3317-3321 ◽

Cited By ~ 36

Author(s):

V. Vancoppenolle ◽

P.-Y. Jouan ◽

M. Wautelet ◽

J.-P. Dauchot ◽

M. Hecq

Keyword(s):

Mass Spectrometry ◽

Thin Films ◽

Glow Discharge ◽

Magnetron Sputtering ◽

Direct Current ◽

Glow Discharge Mass Spectrometry ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

Mass Spectrometry Study

Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films

Thin Solid Films ◽

10.1016/j.tsf.2004.06.159 ◽

2005 ◽

Vol 473 (1) ◽

pp. 58-62 ◽

Cited By ~ 110

Author(s):

Ruijin Hong ◽

Hongji Qi ◽

Jianbing Huang ◽

Hongbo He ◽

Zhengxiu Fan ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Direct Current ◽

Zno Thin Films ◽

Influence of sputtering parameters and nitrogen on the microstructure of chromium nitride thin films deposited on steel substrate by direct-current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2010.05.095 ◽

2010 ◽

Vol 518 (20) ◽

pp. 5762-5768 ◽

Cited By ~ 31

Author(s):

Hetal N. Shah ◽

R. Jayaganthan ◽

Davinder Kaur ◽

Ramesh Chandra

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Steel Substrate ◽

Chromium Nitride ◽

Optical and structural characterization of Tm2O3, TmN, and TmOxNy thin films grown by direct-current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2020.138450 ◽

2021 ◽

Vol 717 ◽

pp. 138450

Author(s):

Axel Meeuwissen ◽

Giacomo B.F. Bosco ◽

Erik van der Kolk

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Structural Characterization ◽

Microstructure and hydrogen impermeability of titanium nitride thin films deposited by direct current reactive magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2016.06.278 ◽

2016 ◽

Vol 688 ◽

pp. 44-50 ◽

Cited By ~ 18

Author(s):

Tong Zhou ◽

Dawei Liu ◽

Ying Zhang ◽

Taoyuan Ouyang ◽

Jinping Suo

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Direct Current ◽

Fabrication of single phase transparent conductive cuprous oxide thin films by direct current reactive magnetron sputtering

2017 China Semiconductor Technology International Conference (CSTIC) ◽

10.1109/cstic.2017.7919814 ◽

2017 ◽

Author(s):

Ruijin Hong ◽

Jinxia Wang ◽

Chunxian Tao ◽

Dawei Zhang

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Cuprous Oxide ◽

Single Phase ◽

Reactive Magnetron ◽

Oxide Thin Films

In situ stress measurements on niobium nitride thin films produced by hollow cathode enhanced direct current reactive magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577297 ◽

1991 ◽

Vol 9 (4) ◽

pp. 2442-2446 ◽

Cited By ~ 3

Author(s):

David F. Dawson‐Elli ◽

David Plantz ◽

Donald S. Stone ◽

James E. Nordman

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Hollow Cathode ◽

In Situ Stress ◽

Niobium Nitride ◽

Reactive Magnetron ◽

In Situ Stress Measurements

Preparation and characterization of Nickel Oxide thin films by direct current reactive magnetron sputtering at different substrate temperatures

Electronic Materials Letters ◽

10.1007/s13391-014-2181-3 ◽

2014 ◽

Vol 10 (5) ◽

pp. 887-892 ◽

Cited By ~ 7

Author(s):

A. Mallikarjuna Reddy ◽

Chang Woo Byun ◽

Seung Ki Joo ◽

A. Sivasankar Reddy ◽

P. Sreedhara Reddy

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Nickel Oxide ◽

Direct Current ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Substrate Temperatures ◽

Nickel Oxide Thin Films

Surface Properties of Nanostructured, Porous ZnO Thin Films Prepared by Direct Current Reactive Magnetron Sputtering

Materials ◽

10.3390/ma11010131 ◽

2018 ◽

Vol 11 (1) ◽

pp. 131 ◽

Cited By ~ 15

Author(s):

Monika Kwoka ◽

Barbara Lyson-Sypien ◽

Anna Kulis ◽

Monika Maslyk ◽

Michal Borysiewicz ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Surface Properties ◽

Direct Current ◽

Zno Thin Films ◽

Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1641049 ◽

2004 ◽

Vol 22 (2) ◽

pp. 260-263 ◽

Cited By ~ 20

Author(s):

Jung W. Lee ◽

Jerome J. Cuomo ◽

Mohamed Bourham

Keyword(s):

Thin Films ◽

Aluminum Nitride ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron ◽

Plasma Characteristics ◽

Pulsed Direct Current