Optimization on Deposition of Aluminum Nitride by Pulsed Direct Current Reactive Magnetron Sputtering

2020 China Semiconductor Technology International Conference (CSTIC) ◽

10.1109/cstic49141.2020.9282480 ◽

2020 ◽

Author(s):

Yu-Pu Yang ◽

Te-Yun Lu ◽

Song-Ho Wang ◽

Hsueh-Er Chang ◽

Peter j. Wang ◽

...

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Pulsed Direct Current

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Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1641049 ◽

2004 ◽

Vol 22 (2) ◽

pp. 260-263 ◽

Author(s):

Jung W. Lee ◽

Jerome J. Cuomo ◽

Mohamed Bourham

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Plasma Characteristics ◽

Pulsed Direct Current

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Epitaxial Growth of CaMnO 3– y Films on LaAlO 3 (112¯0) by Pulsed Direct Current Reactive Magnetron Sputtering

physica status solidi (RRL) - Rapid Research Letters ◽

10.1002/pssr.202100504 ◽

2022 ◽

pp. 2100504

Author(s):

Erik Ekström ◽

Anna Elsukova ◽

Justine Grasland ◽

Justinas Palisaitis ◽

Ganpati Ramanath ◽

...

Keyword(s):

Magnetron Sputtering ◽

Epitaxial Growth ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Pulsed Direct Current

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Effect of Duty Cycle on Characteristics of CrNxThin Films Deposited by Pulsed Direct Current Reactive Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.11nb08 ◽

2013 ◽

Vol 52 (11S) ◽

pp. 11NB08 ◽

Author(s):

Chi-Lung Chang ◽

Bo-Yi Wu ◽

Pin-Hung Chen ◽

Wei-Chih Chen ◽

Chun-Ta Ho ◽

...

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Pulsed Direct Current

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Surface metallic state of aluminum-nitride (AlN) thin films prepared by direct current (DC)-reactive magnetron sputtering: optical spectroscopic analysis with incoherent light

Scripta Materialia ◽

10.1016/j.scriptamat.2003.11.034 ◽

2004 ◽

Vol 50 (5) ◽

pp. 589-592 ◽

Author(s):

Nikifor Rakov ◽

Arshad Mahmood ◽

Mufei Xiao

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Direct Current ◽

Spectroscopic Analysis ◽

Reactive Magnetron Sputtering ◽

Metallic State ◽

Reactive Magnetron ◽

Incoherent Light ◽

Dc Reactive Magnetron Sputtering

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The effects of substrate bias, substrate temperature, and pulse frequency on the microstructures of chromium nitride coatings deposited by pulsed direct current reactive magnetron sputtering

Journal of Electronic Materials ◽

10.1007/s11664-005-0155-9 ◽

2005 ◽

Vol 34 (12) ◽

pp. 1484-1492 ◽

Author(s):

Jyh-Wei Lee ◽

Shih-Kang Tien ◽

Yu-Chu Kuo

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Direct Current ◽

Pulse Frequency ◽

Reactive Magnetron Sputtering ◽

Chromium Nitride ◽

Substrate Bias ◽

Reactive Magnetron ◽

Nitride Coatings ◽

Pulsed Direct Current

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A micro-electromechanical systems based vibration energy harvester with aluminum nitride piezoelectric thin film deposited by pulsed direct-current magnetron sputtering

Applied Energy ◽

10.1016/j.apenergy.2018.07.001 ◽

2018 ◽

Vol 228 ◽

pp. 881-890 ◽

Author(s):

Xianming He ◽

Quan Wen ◽

Zhuang Lu ◽

Zhengguo Shang ◽

Zhiyu Wen

Keyword(s):

Thin Film ◽

Aluminum Nitride ◽

Magnetron Sputtering ◽

Direct Current ◽

Energy Harvester ◽

Vibration Energy ◽

Vibration Energy Harvester ◽

Direct Current Magnetron Sputtering ◽

Piezoelectric Thin Film ◽

Pulsed Direct Current

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Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582059 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3317-3321 ◽

Author(s):

V. Vancoppenolle ◽

P.-Y. Jouan ◽

M. Wautelet ◽

J.-P. Dauchot ◽

M. Hecq

Keyword(s):

Mass Spectrometry ◽

Glow Discharge ◽

Magnetron Sputtering ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Glow Discharge Mass Spectrometry ◽

Reactive Magnetron ◽

Tio2 Thin Films ◽

Mass Spectrometry Study

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Effects of Rapid Thermal Processing on Microstructure and Optical Properties of As-Deposited Ag 2 O Films by Direct-Current Reactive Magnetron Sputtering

Chinese Physics Letters ◽

10.1088/0256-307x/27/2/026804 ◽

2010 ◽

Vol 27 (2) ◽

pp. 026804 ◽

Author(s):

Gao Xiao-Yong ◽

Feng Hong-Liang ◽

Zhang Zeng-Yuan ◽

Ma Jiao-Min ◽

Lu Jing-Xiao

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Direct Current ◽

Thermal Processing ◽

Rapid Thermal Processing ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Overgrowth of indium nitride thin films on aluminum nitride nucleated (00.1) sapphire by reactive magnetron sputtering

Applied Physics Letters ◽

10.1063/1.106190 ◽

1991 ◽

Vol 59 (15) ◽

pp. 1844-1846 ◽

Author(s):

Thomas J. Kistenmacher ◽

Wayne A. Bryden

Keyword(s):

Aluminum Nitride ◽

Magnetron Sputtering ◽

Indium Nitride ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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Structural and ferroelectric properties of bismuth ferrite thin films deposited by direct current reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2015.10.035 ◽

2016 ◽

Vol 601 ◽

pp. 106-110 ◽

Author(s):

Aleksandras Iljinas ◽

Vytautas Stankus

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Bismuth Ferrite ◽

Ferroelectric Properties ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Ferrite Thin Films

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