Integrated feature scale modeling of plasma processing of porous and solid SiO2. I. Fluorocarbon etching

2004 ◽  
Vol 22 (4) ◽  
pp. 1242-1259 ◽  
Author(s):  
Arvind Sankaran ◽  
Mark J. Kushner
Author(s):  
Luiz Felipe Aguinsky ◽  
Georg Wachter ◽  
Francio Rodrigues ◽  
Alexander Scharinger ◽  
Alexander Toifl ◽  
...  

2009 ◽  
Vol 86 (4-6) ◽  
pp. 976-978 ◽  
Author(s):  
M. Hauguth ◽  
B.E. Volland ◽  
V. Ishchuk ◽  
D. Dressler ◽  
T. Danz ◽  
...  

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