Integrated feature scale modeling of plasma processing of porous and solid SiO2. I. Fluorocarbon etching
2004 ◽
Vol 22
(4)
◽
pp. 1242-1259
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2004 ◽
Vol 22
(4)
◽
pp. 1260-1274
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Keyword(s):
2008 ◽
Vol 26
(6)
◽
pp. 1911-1918
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2009 ◽
Vol 86
(4-6)
◽
pp. 976-978
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2002 ◽
Vol 20
(4)
◽
pp. 1284-1294
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2001 ◽
pp. 205-240
Keyword(s):