Inherent substrate-dependent growth initiation and selective-area atomic layer deposition of TiO2 using “water-free” metal-halide/metal alkoxide reactants
2016 ◽
Vol 34
(1)
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pp. 01A148
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2017 ◽
Vol 147
(15)
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pp. 154702
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2021 ◽
Vol 39
(3)
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pp. 032402
2006 ◽
Vol 12
(7)
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pp. 415-417
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2018 ◽
Vol 10
(44)
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pp. 38630-38637
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