Reaction Mechanism Studies on the Atomic Layer Deposition of ZrxTiyOzUsing the Novel Metal Halide−Metal Alkoxide Approach

Langmuir ◽  
2002 ◽  
Vol 18 (25) ◽  
pp. 10046-10048 ◽  
Author(s):  
Antti Rahtu ◽  
Mikko Ritala
Author(s):  
Yanghong Yu ◽  
Zhongchao Zhou ◽  
Lina Xu ◽  
Yihong Ding ◽  
Guoyong Fang

Atomic layer deposition (ALD) is a nanopreparation technique for materials and is widely used in the fields of microelectronics, energy and catalysis. ALD methods for metal sulfides, such as Al2S3...


2019 ◽  
Vol 31 (21) ◽  
pp. 8995-9002
Author(s):  
Il-Kwon Oh ◽  
Jong Seo Park ◽  
Mohammad Rizwan Khan ◽  
Kangsik Kim ◽  
Zonghoon Lee ◽  
...  

2016 ◽  
Vol 16 (5) ◽  
pp. 4924-4928 ◽  
Author(s):  
Byeol Han ◽  
Yu-Jin Kim ◽  
Jae-Min Park ◽  
Luchana L Yusup ◽  
Hana Ishii ◽  
...  

2009 ◽  
Vol 517 (15) ◽  
pp. 4355-4359 ◽  
Author(s):  
Lin Dong ◽  
Qing-Qing Sun ◽  
Yu Shi ◽  
Hao-Wen Guo ◽  
Han Liu ◽  
...  

2004 ◽  
Vol 16 (26) ◽  
pp. 5630-5636 ◽  
Author(s):  
Raija Matero ◽  
Mikko Ritala ◽  
Markku Leskelä ◽  
Timo Sajavaara ◽  
Anthony C. Jones ◽  
...  

RSC Advances ◽  
2017 ◽  
Vol 7 (13) ◽  
pp. 8051-8059 ◽  
Author(s):  
Michael N. Getz ◽  
Per-Anders Hansen ◽  
Helmer Fjellvåg ◽  
Ola Nilsen

Optical and structural characterization of luminescent thin films of the novel material europium titanium phosphate, deposited by atomic layer deposition.


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