Plasma‐assisted chemical vapor deposition of titanium nitride in a capacitively coupled radio‐frequency discharge

1989 ◽  
Vol 7 (5) ◽  
pp. 2952-2959 ◽  
Author(s):  
J. Laimer ◽  
H. Störi ◽  
P. Rödhammer
Keyword(s):  
Chemical Vapor Deposition ◽  
Radio Frequency ◽  
Titanium Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Capacitively Coupled ◽  
Radio Frequency Discharge

Synthesis of carbon nanosheets by inductively coupled radio-frequency plasma enhanced chemical vapor deposition

Carbon ◽  
2004 ◽  
Vol 42 (14) ◽  
pp. 2867-2872 ◽  
Author(s):  
Jianjun Wang ◽  
Mingyao Zhu ◽  
Ron A. Outlaw ◽  
Xin Zhao ◽  
Dennis M. Manos ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Radio Frequency ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Radio Frequency Plasma ◽  
Carbon Nanosheets ◽  
Inductively Coupled ◽  
Frequency Plasma

scholarly journals GROWING CARBON BUCKONIONS BY RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

2001 ◽  
Vol 50 (7) ◽  
pp. 1264
Author(s):  
CHEN XIAO-HUA ◽  
WU GUO-TAO ◽  
DENG FU-MING ◽  
WANG JIAN-XIONG ◽  
YANG HANG-SHENG ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Radio Frequency ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Radio Frequency Plasma ◽  
Frequency Plasma

scholarly journals Deposition of titanium nitride on porous glass by plasma-enhanced chemical vapor deposition.

Shinku ◽  
1991 ◽  
Vol 34 (3) ◽  
pp. 335-338
Author(s):  
Shigeharu TAMURA ◽  
Tetsuo YAZAWA ◽  
Toshiyuki MIHARA ◽  
Sabro KIMURA ◽  
Tadashi ISHIDA ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Titanium Nitride ◽  
Porous Glass ◽  
Vapor Deposition ◽  
Chemical Vapor
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