Etch characterization of an electron cyclotron resonance process reactor

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577276 ◽

1991 ◽

Vol 9 (4) ◽

pp. 2356-2363 ◽

Author(s):

Guadalupe Fortuño‐Wiltshire

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Resonance Process

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Characterization of electron cyclotron resonance process plasma and film deposition

Materials Science and Engineering A ◽

10.1016/0921-5093(91)90632-w ◽

1991 ◽

Vol 139 ◽

pp. 294-301 ◽

Author(s):

Shoji Miyake ◽

Wei Chen

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Process

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Chemical and electrical characterization of AlGaAs/GaAs heterojunction bipolar transistors treated by electron cyclotron resonance plasmas

Applied Physics Letters ◽

10.1063/1.107122 ◽

1992 ◽

Vol 60 (16) ◽

pp. 1996-1998 ◽

Author(s):

P. W. Li ◽

Q. Wang ◽

E. S. Yang

Keyword(s):

Heterojunction Bipolar Transistors ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electrical Characterization ◽

Bipolar Transistors ◽

Electron Cyclotron

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Etch characterization of a broad‐beam electron cyclotron resonance ion source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.576610 ◽

1990 ◽

Vol 8 (3) ◽

pp. 2945-2949 ◽

Author(s):

E. Ghanbari ◽

T. Nguyen ◽

S. Bui ◽

E. Ostan

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Beam Electron ◽

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Spectroscopic characterization of the plasma generated during the deposition of AlxGa1−xN films by pulsed laser co-ablation of Al and GaAs targets in electron cyclotron resonance nitrogen plasma

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/48/24/245203 ◽

2015 ◽

Vol 48 (24) ◽

pp. 245203 ◽

Author(s):

Peipei Liang ◽

Hua Cai ◽

Yanli Li ◽

Xu Yang ◽

Qinghu You ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Pulsed Laser ◽

Spectroscopic Characterization ◽

Nitrogen Plasma ◽

Electron Cyclotron

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Characterization of Ar/Cu electron‐cyclotron‐resonance plasmas using optical emission spectroscopy

Journal of Applied Physics ◽

10.1063/1.363177 ◽

1996 ◽

Vol 80 (5) ◽

pp. 2605-2613 ◽

Author(s):

R. L. Rhoades ◽

S. M. Gorbatkin

Keyword(s):

Cyclotron Resonance ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Electron Cyclotron Resonance ◽

Optical Emission ◽

Electron Cyclotron

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Characterization of electronic and optical properties of device quality a‐Si:H and a‐(Si,Ge):H grown by remote plasma electron cyclotron resonance deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577391 ◽

1991 ◽

Vol 9 (3) ◽

pp. 474-479 ◽

Author(s):

R. D. Knox ◽

V. L. Dalal ◽

O. A. Popov

Keyword(s):

Optical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Electron ◽

Electron Cyclotron ◽

Remote Plasma ◽

Electronic And Optical Properties

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Characterization of He-induced Bubble Formation in Tungsten due to Exposure from an Electron Cyclotron Resonance Plasma Source

Fusion Science & Technology ◽

10.1080/15361055.2017.1333856 ◽

2017 ◽

pp. 1-10 ◽

Author(s):

D. Donovan ◽

D. Buchenauer ◽

J. Whaley ◽

G. Wright ◽

C.M. Parish ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Bubble Formation ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Characterization of a new electron cyclotron resonance source working with permanent magnets

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585614 ◽

1991 ◽

Vol 9 (2) ◽

pp. 334 ◽

Author(s):

G. Neumann

Keyword(s):

Cyclotron Resonance ◽

Permanent Magnets ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron

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Picosecond time-resolved photoluminescence characterization of a-SiC:H films prepared by electron cyclotron resonance plasma

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(05)80255-8 ◽

1991 ◽

Vol 137-138 ◽

pp. 859-862 ◽

Author(s):

S. Gangopadhyay ◽

M. Pleil ◽

W. Borst ◽

C. Young ◽

M. Kristiansen

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Time Resolved ◽

Time Resolved Photoluminescence ◽

Resonance Plasma

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Discharge Characterization of 40-Centimeter Microwave Electron Cyclotron Resonance Ion Source and Neutralizer

Journal of Propulsion and Power ◽

10.2514/1.4932 ◽

2005 ◽

Vol 21 (5) ◽

pp. 862-869 ◽

Author(s):

John E. Foster ◽

Michael J. Patterson

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron

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