Electron cyclotron resonance reactive ion etching of fine features in HgxCd1−xTe using CH4/H2 plasmas
1993 ◽
Vol 11
(4)
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pp. 1763-1767
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Keyword(s):
2003 ◽
Vol 42
(Part 1, No. 6B)
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pp. 3958-3961
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1995 ◽
Vol 34
(Part 1, No. 4B)
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pp. 2147-2151
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1994 ◽
Vol 12
(3)
◽
pp. 665-670
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1997 ◽
Vol 15
(3)
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pp. 664-667
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1994 ◽
Vol 12
(4)
◽
pp. 1957-1961
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1994 ◽
Vol 12
(6)
◽
pp. 3351
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Keyword(s):
1994 ◽
Vol 33
(Part 1, No. 4B)
◽
pp. 2170-2174
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