Factors affecting interface-state density and stress of silicon nitride films deposited on Si by electron-cyclotron resonance chemical vapor deposition
1998 ◽
Vol 16
(5)
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pp. 2931-2940
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1991 ◽
Vol 9
(6)
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pp. 3071-3077
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1997 ◽
Vol 294
(1-2)
◽
pp. 214-216
◽
1995 ◽
Vol 13
(6)
◽
pp. 2900-2907
◽
1998 ◽
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