Study of thin film deposition processes employing variable kinetic energy, highly collimated neutral molecular beams

1998 ◽  
Vol 16 (6) ◽  
pp. 3423-3433 ◽  
Author(s):  
S. E. Roadman ◽  
N. Maity ◽  
J. N. Carter ◽  
J. R. Engstrom
Keyword(s):  
Thin Film ◽  
Kinetic Energy ◽  
Molecular Beams ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Deposition Processes

Deposition of diamond-like carbon

1993 ◽  
Vol 342 (1664) ◽  
pp. 277-286 ◽  
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Diamond Like Carbon ◽  
Hydrogenated Amorphous Carbon ◽  
Sizeable Fraction ◽  
Deposition Processes ◽  
Hydrogenated Amorphous

Diamond-like carbon refers to forms of amorphous carbon and hydrogenated amorphous carbon containing a sizeable fraction of sp 3 bonding, which makes them mechanically hard, infrared transparent and chemically inert. This paper discusses the various thin film deposition processes used to form diamond-like carbon and the deposition mechanisms responsible for promoting the metastable sp 3 bonding.

Thin-Film Deposition Processes

2016 ◽  
pp. 157-189
Author(s):  
Andreas Pflug ◽  
Michael Siemers ◽  
Thomas Melzig ◽  
Martin Keunecke ◽  
Lothar Schäfer ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Deposition Processes

Multiscale structured low-temperature solid oxide fuel cells with 13 W power at 500 °C

2020 ◽  
Vol 13 (10) ◽  
pp. 3459-3468 ◽  
Author(s):  
Sung Soo Shin ◽  
Jeong Hun Kim ◽  
Kyung Taek Bae ◽  
Kang-Taek Lee ◽  
Sang Moon Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Fuel Cell ◽  
Low Temperature ◽  
Solid Oxide Fuel Cells ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Solid Oxide ◽  
Oxide Fuel ◽  
Large Area ◽  
Deposition Processes

A multiscale architectured solid oxide fuel cell is demonstrated by applying a large-area ceramic micropatterning and thin-film deposition processes.

Progress in Optimization of Physical Vapor Deposition of Thin Films

2021 ◽  
pp. 243-259
Author(s):  
Fredrick M. Mwema ◽  
Esther T. Akinlabi ◽  
Oluseyi Philip Oladijo
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Evaluation Criteria ◽  
Chemical Deposition ◽  
Thin Film Deposition ◽  
Optimization Techniques ◽  
Film Deposition ◽  
Physical Deposition ◽  
Deposition Processes

In this chapter, the current state of the art in optimization of thin film deposition processes is discussed. Based on the reliable and credible published results, the study aims to identify the applications of various optimization techniques in the thin film deposition processes, with emphasis on physical deposition methods. These methods are chosen due to their attractive attributes over chemical deposition techniques for thin film manufacturing. The study identifies the critical parameters and factors, which are significant in designing of the optimization algorithms based on the specific deposition methods. Based on the specific optimization studies, the chapter provides general trends, optimization evaluation criteria, and input-output parameter relationships on thin film deposition. Research gaps and directions for future studies on optimization of physical vapor deposition methods for thin film manufacturing are provided.

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