Excimer-laser etching of diamond and hard carbon films by direct writing and optical projection

Author(s):  
M. Rothschild
1992 ◽  
Author(s):  
Taras V. Kononenko ◽  
Vitali I. Konov ◽  
Victor G. Ralchenko ◽  
V. E. Strelnitsky

1995 ◽  
Vol 86 (1-4) ◽  
pp. 234-238 ◽  
Author(s):  
T.V. Kononenko ◽  
V.G. Ralchenko ◽  
E.D. Obraztsova ◽  
V.I. Konov ◽  
Jayshree Seth ◽  
...  

1994 ◽  
Vol 354 ◽  
Author(s):  
K.C. Walter ◽  
H. Kung ◽  
T. Levine ◽  
J.T. Tesmer ◽  
P. Kodali ◽  
...  

AbstractPlasma and ion beam based techniques have been used to deposit carbon-based films. The ion beam based method, a cathodic arc process, used a magnetically mass analyzed beam and is inherently a line-of-sight process. Two hydrocarbon plasma-based, non-line-of-sight techniques were also used and have the advantage of being capable of coating complicated geometries. The self-bias technique can produce hard carbon films, but is dependent on rf power and the surface area of the target. The pulsed-bias technique can also produce hard carbon films but has the additional advantage of being independent of rf power and target surface area. Tribological results indicated the coefficient of friction is nearly the same for carbon films from each deposition process, but the wear rate of the cathodic arc film was five times less than for the self-bias or pulsed-bias films. Although the cathodic arc film was the hardest, contained the highest fraction of sp3 bonds and exhibited the lowest wear rate, the cathodic arc film also produced the highest wear on the 440C stainless steel counterface during tribological testing. Thus, for tribological applications requiring low wear rates for both counterfaces, coating one surface with a very hard, wear resistant film may detrimentally affect the tribological behavior of the counterface.


Vacuum ◽  
1990 ◽  
Vol 40 (3) ◽  
pp. 251-255 ◽  
Author(s):  
H Biederman ◽  
K Kohoutek ◽  
Z Chmel ◽  
V Stary ◽  
RP Howson

2003 ◽  
Vol 42 (31) ◽  
pp. 6349 ◽  
Author(s):  
Kris Naessens ◽  
Heidi Ottevaere ◽  
Roel Baets ◽  
Peter Van Daele ◽  
Hugo Thienpont

1993 ◽  
Vol 316 ◽  
Author(s):  
J. Ullmann ◽  
A. Weber ◽  
U. Falke

ABSTRACTFor a deeper understanding of the creation of carbon films the hydrogen-free ion assisted evaporation (IAE) method with neon species was used. Variation of the ion parameters energy and ion to neutral arrival ratio, delivering the necessary energy for modification of the film growth, results in different microstructures investigated with EELS, HRTEM and TED as well as different microhardnesses measured by dynamical Vickers indentation. A possible film growth mechanism is proposed based on an ion etching of mainly sp2-bonded carbon surface atoms and on defect dominated structure modification below the surface depending on the ion energy


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