Silicon epitaxial growth on germanium using an Si2H6 low-pressure chemical vapor deposition technique

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.584721 ◽

1989 ◽

Vol 7 (2) ◽

pp. 225 ◽

Author(s):

Kiyohisa Fujinaga

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Pressure Chemical

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New low pressure chemical vapor deposition technique for Ge crystalline thin films

Applied Physics Letters ◽

10.1063/1.110464 ◽

1993 ◽

Vol 63 (18) ◽

pp. 2508-2510 ◽

Author(s):

Masaji Yamamoto ◽

Jun‐ichi Hanna ◽

Masato Miyauchi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Pressure Chemical

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Hydrogen bonding in amorphous silicon with use of the low-pressure chemical-vapor-deposition technique

Physical Review B ◽

10.1103/physrevb.43.6627 ◽

1991 ◽

Vol 43 (8) ◽

pp. 6627-6632 ◽

Author(s):

G. Amato ◽

G. Della Mea ◽

F. Fizzotti ◽

C. Manfredotti ◽

R. Marchisio ◽

...

Keyword(s):

Hydrogen Bonding ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Pressure Chemical

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Epitaxial growth of Ge on 〈100〉 Si by a simple chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.92695 ◽

1981 ◽

Vol 39 (3) ◽

pp. 245-247 ◽

Author(s):

T. F. Kuech ◽

M. Mäenpää ◽

S. S. Lau

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Simple Chemical

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Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique

Carbon letters ◽

10.1007/s42823-021-00309-3 ◽

2021 ◽

Author(s):

Mehmet Gürsoy ◽

Emre Çıtak ◽

Mustafa Karaman

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Graphene Films ◽

Vapor Deposition Technique ◽

Pressure Chemical ◽

Uniform Deposition

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EPITAXIAL GROWTH OF α-SiC LAYERS BY CHEMICAL VAPOR DEPOSITION TECHNIQUE

Vapour Growth and Epitaxy ◽

10.1016/b978-1-4831-9854-5.50014-8 ◽

1975 ◽

pp. 72-75

Author(s):

Hiroyuki MATSUNAMI ◽

Shigehiro NISHINO ◽

Masanori ODAKA ◽

Tetsuro TANAKA

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Ohmic contacts to InP-based materials induced by means of rapid thermal low pressure (metallorganic) chemical vapor deposition technique

Journal of Electronic Materials ◽

10.1007/bf03030209 ◽

1991 ◽

Vol 20 (12) ◽

pp. 1069-1073 ◽

Author(s):

A. Katz

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Ohmic Contacts ◽

Chemical Vapor ◽

Low Pressure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Epitaxial growth of α-SiC layers by chemical vapor deposition technique

Journal of Crystal Growth ◽

10.1016/0022-0248(75)90113-x ◽

1975 ◽

Vol 31 ◽

pp. 72-75 ◽

Author(s):

Hiroyuki Matsunami ◽

Shigehiro Nishino ◽

Masanori Odaka ◽

Tetsuro Tanaka

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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RETRACTED: Synthesis of carbon nanotubes using the cobalt nanocatalyst by thermal chemical vapor deposition technique

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2015.07.063 ◽

2015 ◽

Vol 648 ◽

pp. 1104-1108 ◽

Author(s):

S.S. Madani ◽

K. Zare ◽

M. Ghoranneviss ◽

A. Salar Elahi

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Thermal Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Synthesis Of Carbon Nanotubes

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Investigation of polycrystalline silicon grain structure with single wafer chemical vapor deposition technique

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1355364 ◽

2001 ◽

Vol 19 (4) ◽

pp. 1898-1901 ◽

Author(s):

H. Bu ◽

C. Hu ◽

M. Bevan ◽

S. Wang ◽

E. Sanchez ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Grain Structure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Fabrication of aluminum oxide thin films by a low‐pressure metalorganic chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.108838 ◽

1993 ◽

Vol 62 (7) ◽

pp. 681-683 ◽

Author(s):

J. S. Kim ◽

H. A. Marzouk ◽

P. J. Reucroft ◽

J. D. Robertson ◽

C. E. Hamrin

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Metalorganic Chemical

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