Uniform deposition of large-area graphene films on copper using low-pressure chemical vapor deposition technique

Carbon letters ◽

10.1007/s42823-021-00309-3 ◽

2021 ◽

Author(s):

Mehmet Gürsoy ◽

Emre Çıtak ◽

Mustafa Karaman

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Graphene Films ◽

Vapor Deposition Technique ◽

Pressure Chemical ◽

Uniform Deposition

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New low pressure chemical vapor deposition technique for Ge crystalline thin films

Applied Physics Letters ◽

10.1063/1.110464 ◽

1993 ◽

Vol 63 (18) ◽

pp. 2508-2510 ◽

Author(s):

Masaji Yamamoto ◽

Jun‐ichi Hanna ◽

Masato Miyauchi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Pressure Chemical

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Hydrogen bonding in amorphous silicon with use of the low-pressure chemical-vapor-deposition technique

Physical Review B ◽

10.1103/physrevb.43.6627 ◽

1991 ◽

Vol 43 (8) ◽

pp. 6627-6632 ◽

Author(s):

G. Amato ◽

G. Della Mea ◽

F. Fizzotti ◽

C. Manfredotti ◽

R. Marchisio ◽

...

Keyword(s):

Hydrogen Bonding ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Pressure Chemical

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Silicon epitaxial growth on germanium using an Si2H6 low-pressure chemical vapor deposition technique

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.584721 ◽

1989 ◽

Vol 7 (2) ◽

pp. 225 ◽

Author(s):

Kiyohisa Fujinaga

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Pressure Chemical

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RETRACTED: Synthesis of carbon nanotubes using the cobalt nanocatalyst by thermal chemical vapor deposition technique

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2015.07.063 ◽

2015 ◽

Vol 648 ◽

pp. 1104-1108 ◽

Author(s):

S.S. Madani ◽

K. Zare ◽

M. Ghoranneviss ◽

A. Salar Elahi

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Thermal Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Synthesis Of Carbon Nanotubes

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Investigation of polycrystalline silicon grain structure with single wafer chemical vapor deposition technique

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1355364 ◽

2001 ◽

Vol 19 (4) ◽

pp. 1898-1901 ◽

Author(s):

H. Bu ◽

C. Hu ◽

M. Bevan ◽

S. Wang ◽

E. Sanchez ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Grain Structure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Fabrication of aluminum oxide thin films by a low‐pressure metalorganic chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.108838 ◽

1993 ◽

Vol 62 (7) ◽

pp. 681-683 ◽

Author(s):

J. S. Kim ◽

H. A. Marzouk ◽

P. J. Reucroft ◽

J. D. Robertson ◽

C. E. Hamrin

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Metalorganic Chemical

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Taguchi Method Optimization of Parameters for Growth of Nano Dimensional SiC Wires by Chemical Vapor Deposition Technique

Current Nanoscience ◽

10.2174/1573413711208010161 ◽

2012 ◽

Vol 8 (1) ◽

pp. 161-169 ◽

Author(s):

Jyoti Prakash ◽

Sunil K. Ghosh ◽

D. Sathiyamoorthy ◽

R. Venugopalan ◽

B. Paul

Keyword(s):

Chemical Vapor Deposition ◽

Taguchi Method ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Optimization Of Parameters ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Method Optimization

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Synthesis and Electrical Properties of (Bi1/2Na1/2)TiO3(BNT) Ferroelectric Thin Films by Liquid Sprayed Mist Chemical Vapor Deposition Technique

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2006.038 ◽

2006 ◽

Vol 6 (11) ◽

pp. 3479-3482

Author(s):

Bok-Hee Kim ◽

Sang-Hee Kim ◽

Jong-Hwan Kim ◽

Kun-Jae Lee ◽

Yong-Ho Choa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Ferroelectric Thin Films ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Epitaxial growth of Ge on 〈100〉 Si by a simple chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.92695 ◽

1981 ◽

Vol 39 (3) ◽

pp. 245-247 ◽

Author(s):

T. F. Kuech ◽

M. Mäenpää ◽

S. S. Lau

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Simple Chemical

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Au/nc-Si:H core–shell nanostructures prepared by hot wire assisted plasma enhanced chemical vapor deposition technique

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.04.077 ◽

2013 ◽

Vol 231 ◽

pp. 394-398 ◽

Author(s):

Kee Wah Chan ◽

Boon Tong Goh ◽

Saadah Abdul Rahman ◽

Zarina Aspanut

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Shell Nanostructures ◽

Vapor Deposition Technique

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