Fabrication of diamond tips by the microwave plasma chemical vapor deposition technique

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587583 ◽

1994 ◽

Vol 12 (3) ◽

pp. 1712 ◽

Author(s):

N. Liu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Hydrogenated Carbon Nitride Thin Films Deposited by the Plasma Chemical Vapor Deposition Technique Using Trimethylamine and Ammonia

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.5187 ◽

1997 ◽

Vol 36 (Part 1, No. 8) ◽

pp. 5187-5191 ◽

Author(s):

Satoshi Kobayashi ◽

Shinji Nozaki ◽

Hiroshi Morisaki ◽

Susumu Masaki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Comparative study of diamond films grown on silicon substrate using microwave plasma chemical vapor deposition and hot-filament chemical vapor deposition technique

Korean Journal of Chemical Engineering ◽

10.1007/bf02705797 ◽

2005 ◽

Vol 22 (5) ◽

pp. 770-773 ◽

Author(s):

Mushtaq Ahmad Dar ◽

Young-Soon Kim ◽

Shafeeque G. Ansari ◽

Hyung-il Kim ◽

Gilson Khang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Vapor Deposition Technique ◽

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Residual Stress of a-Si1-xNx:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.l867 ◽

1992 ◽

Vol 31 (Part 2, No. 7A) ◽

pp. L867-L869 ◽

Author(s):

Hiroshi Nagayoshi ◽

Haruji Morinaka ◽

Koichi Kamisako ◽

Koichi Kuroiwa ◽

Toshikazu Shimada ◽

...

Keyword(s):

Residual Stress ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Afterglow Plasma

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Generation Mechanism of Tensile Stress in a-Si1-xNx:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.l1628 ◽

1992 ◽

Vol 31 (Part 2, No. 11B) ◽

pp. L1628-L1631 ◽

Author(s):

Hiroshi Nagayoshi ◽

Wong Chee Hoe ◽

Tomo Ueno ◽

Koichi Kamisako ◽

Koichi Kuroiwa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Tensile Stress ◽

Vapor Deposition ◽

Chemical Vapor ◽

Generation Mechanism ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Vapor Deposition Technique ◽

Afterglow Plasma

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Realization of different carbon nanostructures by a microwave plasma enhanced chemical vapor deposition technique

Applied Surface Science ◽

10.1016/s0169-4332(01)00422-6 ◽

2001 ◽

Vol 182 (3-4) ◽

pp. 326-332 ◽

Author(s):

Sudheer Kumar ◽

C.M.S. Rauthan ◽

K.M.K. Srivatsa ◽

P.N. Dixit ◽

R. Bhattacharyya

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nanostructures ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Synthesis of Vertical Graphene by Microwave Plasma Enhanced Chemical Vapor Deposition Technique

Physics of Semiconductor Devices - Environmental Science and Engineering ◽

10.1007/978-3-319-03002-9_140 ◽

2014 ◽

pp. 559-562 ◽

Author(s):

Atul Bisht ◽

Sreekumar Chockalingam ◽

O. S. Panwar ◽

B. P. Singh ◽

Ajay Kesarwani ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Effect of the Gas Chemistry, Total Pressure, and Microwave Power on the Grain Size and Growth Rate of Polycrystalline Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition Technique

2019 7th International Engineering, Sciences and Technology Conference (IESTEC) ◽

10.1109/iestec46403.2019.00024 ◽

2019 ◽

Author(s):

Pablo Tirado ◽

Jesus Alcantar ◽

Elida de Obaldia ◽

Rafael Garcia ◽

Orlando Auciello

Keyword(s):

Vapor Deposition ◽

Total Pressure ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Vapor Deposition Technique

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Synthesis of Nanostructure Carbon Films Deposited by Microwave Plasma-Enhanced Chemical Vapor Deposition Technique at Room Temperature

Fullerenes Nanotubes and Carbon Nanostructures ◽

10.1080/1536383x.2014.921783 ◽

2014 ◽

Vol 23 (5) ◽

pp. 455-462 ◽

Author(s):

Atul Bisht ◽

Sreekumar Chockalingam ◽

O. S. Panwar ◽

A. K. Srivastava ◽

Ajay Kumar Kesarwani

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Room Temperature ◽

Microwave Plasma ◽

Chemical Vapor ◽

Carbon Films ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Silicon nitride deposition using Inductive Coupled Plasma Chemical Vapor Deposition technique to study optoelectronics behavior for solar cell application

Optik ◽

10.1016/j.ijleo.2016.03.040 ◽

2016 ◽

Vol 127 (13) ◽

pp. 5240-5244 ◽

Author(s):

S. Maity ◽

S. Sahare

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Solar Cell Application ◽

Plasma Chemical Vapor Deposition ◽

Vapor Deposition Technique

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Growth of dense CNT on the multilayer graphene film by the microwave plasma enhanced chemical vapor deposition technique and their field emission properties

RSC Advances ◽

10.1039/c5ra16917h ◽

2015 ◽

Vol 5 (109) ◽

pp. 90111-90120 ◽

Author(s):

Atul Bisht ◽

S. Chockalingam ◽

O. S. Panwar ◽

A. K. Kesarwani ◽

B. P. Singh ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Graphene Film ◽

Chemical Vapor ◽

Multilayer Graphene ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Field Emission Properties ◽

Vapor Deposition Technique

Catalyst assisted carbon nanotubes (CNTs) were grown on multilayer graphene (MLG) on copper and silicon substrates by the microwave plasma enhanced chemical vapor deposition technique.

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