Generation Mechanism of Tensile Stress in a-Si1-xNx:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique

Tensile Stress ◽

Vapor Deposition ◽

Chemical Vapor ◽

Generation Mechanism ◽

Deposition Technique ◽

Plasma Chemical ◽

Afterglow Plasma

Residual Stress of a-Si1-xNx:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.l867 ◽

1992 ◽

Vol 31 (Part 2, No. 7A) ◽

pp. L867-L869 ◽

Cited By ~ 3

Author(s):

Hiroshi Nagayoshi ◽

Haruji Morinaka ◽

Koichi Kamisako ◽

Koichi Kuroiwa ◽

Toshikazu Shimada ◽

...

Keyword(s):

Residual Stress ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Chemical Vapor Deposition Technique ◽

Afterglow Plasma

Hydrogenated Carbon Nitride Thin Films Deposited by the Plasma Chemical Vapor Deposition Technique Using Trimethylamine and Ammonia

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.5187 ◽

1997 ◽

Vol 36 (Part 1, No. 8) ◽

pp. 5187-5191 ◽

Cited By ~ 11

Author(s):

Satoshi Kobayashi ◽

Shinji Nozaki ◽

Hiroshi Morisaki ◽

Susumu Masaki

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Chemical Vapor Deposition Technique ◽

Comparative study of diamond films grown on silicon substrate using microwave plasma chemical vapor deposition and hot-filament chemical vapor deposition technique

Korean Journal of Chemical Engineering ◽

10.1007/bf02705797 ◽

2005 ◽

Vol 22 (5) ◽

pp. 770-773 ◽

Cited By ~ 3

Author(s):

Mushtaq Ahmad Dar ◽

Young-Soon Kim ◽

Shafeeque G. Ansari ◽

Hyung-il Kim ◽

Gilson Khang ◽

...

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Hot Filament

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Fabrication of diamond tips by the microwave plasma chemical vapor deposition technique

10.1116/1.587583 ◽

1994 ◽

Vol 12 (3) ◽

pp. 1712 ◽

Cited By ~ 32

Author(s):

N. Liu

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Chemical Vapor Deposition Technique ◽

Silicon nitride deposition using Inductive Coupled Plasma Chemical Vapor Deposition technique to study optoelectronics behavior for solar cell application

Optik ◽

10.1016/j.ijleo.2016.03.040 ◽

2016 ◽

Vol 127 (13) ◽

pp. 5240-5244 ◽

Cited By ~ 3

Author(s):

S. Maity ◽

S. Sahare

Keyword(s):

Solar Cell ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Solar Cell Application ◽

Deposition of nanostructured thin films using an inductively coupled plasma chemical vapor deposition technique

Ceramics International ◽

10.1016/j.ceramint.2003.12.053 ◽

2004 ◽

Vol 30 (7) ◽

pp. 1869-1872 ◽

Cited By ~ 13

Author(s):

Y.C. Lee ◽

O.K. Tan ◽

M.S. Tse ◽

A. Srivastava

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Inductively Coupled ◽

Low Temperature Deposition of β-phase Silicon Nitride Using Inductively Coupled Plasma Chemical Vapor Deposition Technique

10.1063/1.3530478 ◽

2010 ◽

Author(s):

Abhijeet Kshirsagar ◽

S. P. Duttagupta ◽

S. A. Gangal ◽

Dinesh K. Aswal ◽

Anil K. Debnath

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Inductively Coupled ◽

Β Phase ◽

Temperature Deposition

Effect of the Gas Chemistry, Total Pressure, and Microwave Power on the Grain Size and Growth Rate of Polycrystalline Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition Technique

2019 7th International Engineering, Sciences and Technology Conference (IESTEC) ◽

10.1109/iestec46403.2019.00024 ◽

2019 ◽

Author(s):

Pablo Tirado ◽

Jesus Alcantar ◽

Elida de Obaldia ◽

Rafael Garcia ◽

Orlando Auciello

Keyword(s):

Vapor Deposition ◽

Total Pressure ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Deposition Technique ◽

Plasma Chemical ◽

Effects of oxygen and nitrogen on carbon nanotube growth using a microwave plasma chemical vapor deposition technique

Surface and Coatings Technology ◽

10.1016/s0257-8972(02)00921-0 ◽

2003 ◽

Vol 167 (2-3) ◽

pp. 288-291 ◽

Cited By ~ 17

Author(s):

D.J. Yang ◽

Q. Zhang ◽

S.F. Yoon ◽

J. Ahn ◽

S.G. Wang ◽

...

Keyword(s):

Carbon Nanotube ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Carbon Nanotube Growth ◽

Nanotube Growth

Remote hydrogen plasma chemical vapor deposition from alkylsilane and alkylcarbosilane single-sources: Mechanism of the process and properties of resulting silicon-carbon deposits

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:2001388 ◽

2001 ◽

Vol 11 (PR3) ◽

pp. Pr3-691-Pr3-702

Author(s):

A. M. Wrobel

Keyword(s):

Vapor Deposition ◽

Hydrogen Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Carbon Deposits ◽

Silicon Carbon