Hydrogenated Carbon Nitride Thin Films Deposited by the Plasma Chemical Vapor Deposition Technique Using Trimethylamine and Ammonia

1997 ◽  
Vol 36 (Part 1, No. 8) ◽  
pp. 5187-5191 ◽  
Author(s):  
Satoshi Kobayashi ◽  
Shinji Nozaki ◽  
Hiroshi Morisaki ◽  
Susumu Masaki
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Carbon Nitride ◽  
Chemical Vapor ◽  
Deposition Technique ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Chemical Vapor Deposition Technique ◽  
Vapor Deposition Technique

Residual Stress of a-Si1-xNx:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique

1992 ◽  
Vol 31 (Part 2, No. 7A) ◽  
pp. L867-L869 ◽  
Author(s):  
Hiroshi Nagayoshi ◽  
Haruji Morinaka ◽  
Koichi Kamisako ◽  
Koichi Kuroiwa ◽  
Toshikazu Shimada ◽  
...  
Keyword(s):  
Residual Stress ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Technique ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Chemical Vapor Deposition Technique ◽  
Vapor Deposition Technique ◽  
Afterglow Plasma

Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

2000 ◽  
Vol 9 (7) ◽  
pp. 545-549
Author(s):  
Zhang Yong-ping ◽  
Gu You-song ◽  
Chang Xiang-rong ◽  
Tian Zhong-zhuo ◽  
Shi Dong-xia ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Carbon Nitride ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

Functionalizable and electrically conductive thin films formed by oxidative chemical vapor deposition (oCVD) from mixtures of 3-thiopheneethanol (3TE) and ethylene dioxythiophene (EDOT)

2016 ◽  
Vol 4 (16) ◽  
pp. 3403-3414 ◽  
Author(s):  
Hilal Goktas ◽  
Xiaoxue Wang ◽  
Nicolas D. Boscher ◽  
Stephen Torosian ◽  
Karen K. Gleason
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Optoelectronic Properties ◽  
Deposition Technique ◽  
Electrically Conductive ◽  
Chemical Vapor Deposition Technique ◽  
Vapor Deposition Technique ◽  
Conductive Thin Films

Tuning the optoelectronic properties and the density of hydroxyl pendant groups of 3-thiopheneethanol-co-ethylenedioxythiohene produced via an oxidative chemical vapor deposition technique.

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