Residual Stress of a-Si1-xNx:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.l867 ◽

1992 ◽

Vol 31 (Part 2, No. 7A) ◽

pp. L867-L869 ◽

Author(s):

Hiroshi Nagayoshi ◽

Haruji Morinaka ◽

Koichi Kamisako ◽

Koichi Kuroiwa ◽

Toshikazu Shimada ◽

...

Keyword(s):

Residual Stress ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Afterglow Plasma

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Hydrogenated Carbon Nitride Thin Films Deposited by the Plasma Chemical Vapor Deposition Technique Using Trimethylamine and Ammonia

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.5187 ◽

1997 ◽

Vol 36 (Part 1, No. 8) ◽

pp. 5187-5191 ◽

Author(s):

Satoshi Kobayashi ◽

Shinji Nozaki ◽

Hiroshi Morisaki ◽

Susumu Masaki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Generation Mechanism of Tensile Stress in a-Si1-xNx:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.l1628 ◽

1992 ◽

Vol 31 (Part 2, No. 11B) ◽

pp. L1628-L1631 ◽

Author(s):

Hiroshi Nagayoshi ◽

Wong Chee Hoe ◽

Tomo Ueno ◽

Koichi Kamisako ◽

Koichi Kuroiwa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Tensile Stress ◽

Vapor Deposition ◽

Chemical Vapor ◽

Generation Mechanism ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Vapor Deposition Technique ◽

Afterglow Plasma

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Fabrication of diamond tips by the microwave plasma chemical vapor deposition technique

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587583 ◽

1994 ◽

Vol 12 (3) ◽

pp. 1712 ◽

Author(s):

N. Liu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Comparative study of diamond films grown on silicon substrate using microwave plasma chemical vapor deposition and hot-filament chemical vapor deposition technique

Korean Journal of Chemical Engineering ◽

10.1007/bf02705797 ◽

2005 ◽

Vol 22 (5) ◽

pp. 770-773 ◽

Author(s):

Mushtaq Ahmad Dar ◽

Young-Soon Kim ◽

Shafeeque G. Ansari ◽

Hyung-il Kim ◽

Gilson Khang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Vapor Deposition Technique ◽

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Silicon nitride deposition using Inductive Coupled Plasma Chemical Vapor Deposition technique to study optoelectronics behavior for solar cell application

Optik ◽

10.1016/j.ijleo.2016.03.040 ◽

2016 ◽

Vol 127 (13) ◽

pp. 5240-5244 ◽

Author(s):

S. Maity ◽

S. Sahare

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Solar Cell Application ◽

Plasma Chemical Vapor Deposition ◽

Vapor Deposition Technique

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Deposition of nanostructured thin films using an inductively coupled plasma chemical vapor deposition technique

Ceramics International ◽

10.1016/j.ceramint.2003.12.053 ◽

2004 ◽

Vol 30 (7) ◽

pp. 1869-1872 ◽

Author(s):

Y.C. Lee ◽

O.K. Tan ◽

M.S. Tse ◽

A. Srivastava

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Vapor Deposition Technique

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RETRACTED: Synthesis of carbon nanotubes using the cobalt nanocatalyst by thermal chemical vapor deposition technique

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2015.07.063 ◽

2015 ◽

Vol 648 ◽

pp. 1104-1108 ◽

Author(s):

S.S. Madani ◽

K. Zare ◽

M. Ghoranneviss ◽

A. Salar Elahi

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Thermal Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Synthesis Of Carbon Nanotubes

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Investigation of polycrystalline silicon grain structure with single wafer chemical vapor deposition technique

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1355364 ◽

2001 ◽

Vol 19 (4) ◽

pp. 1898-1901 ◽

Author(s):

H. Bu ◽

C. Hu ◽

M. Bevan ◽

S. Wang ◽

E. Sanchez ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Grain Structure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Fabrication of aluminum oxide thin films by a low‐pressure metalorganic chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.108838 ◽

1993 ◽

Vol 62 (7) ◽

pp. 681-683 ◽

Author(s):

J. S. Kim ◽

H. A. Marzouk ◽

P. J. Reucroft ◽

J. D. Robertson ◽

C. E. Hamrin

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Metalorganic Chemical

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Taguchi Method Optimization of Parameters for Growth of Nano Dimensional SiC Wires by Chemical Vapor Deposition Technique

Current Nanoscience ◽

10.2174/1573413711208010161 ◽

2012 ◽

Vol 8 (1) ◽

pp. 161-169 ◽

Author(s):

Jyoti Prakash ◽

Sunil K. Ghosh ◽

D. Sathiyamoorthy ◽

R. Venugopalan ◽

B. Paul

Keyword(s):

Chemical Vapor Deposition ◽

Taguchi Method ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Optimization Of Parameters ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Method Optimization

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