Method for angular sputter yield extraction for high-density plasma chemical vapor deposition simulators

1998 ◽  
Vol 16 (3) ◽  
pp. 1123 ◽  
Author(s):  
P. Kapur
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
High Density ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Sputter Yield ◽  
Density Plasma

Calibration Method for High-Density-Plasma Chemical Vapor Deposition Simulation

2002 ◽  
Vol 41 (Part 1, No. 4A) ◽  
pp. 1974-1980 ◽  
Author(s):  
Shigeru Kinoshita ◽  
Shigeyuki Takagi ◽  
Hidehiko Yabuhara ◽  
Hiroshi Nishimura ◽  
Hideichi Kawaguchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Calibration Method ◽  
High Density ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Deposition Simulation ◽  
Density Plasma
Sign in / Sign up

Export Citation Format

Share Document