Calibration Method for High-Density-Plasma Chemical Vapor Deposition Simulation

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.1974 ◽

2002 ◽

Vol 41 (Part 1, No. 4A) ◽

pp. 1974-1980 ◽

Author(s):

Shigeru Kinoshita ◽

Shigeyuki Takagi ◽

Hidehiko Yabuhara ◽

Hiroshi Nishimura ◽

Hideichi Kawaguchi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Calibration Method ◽

High Density ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Deposition Simulation ◽

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High-density plasma chemical vapor deposition of amorphous carbon films

Diamond and Related Materials ◽

10.1016/s0925-9635(03)00371-6 ◽

2003 ◽

Author(s):

A Mousinho

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

High Density ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

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Control of Plasma Damage to Gate Oxide during High Density Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2048449 ◽

1995 ◽

Vol 142 (11) ◽

pp. L208-L211 ◽

Author(s):

Subhas Bothra ◽

Calvin T. Gabriel ◽

Stephan Lassig ◽

David Pirkle

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Plasma Damage ◽

Plasma Chemical Vapor Deposition ◽

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Influence of RF Bias on Hydrogenated Amorphous Silicon by High-Density Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2713723 ◽

2007 ◽

Vol 154 (5) ◽

pp. G122 ◽

Author(s):

Wen-Chu Hsiao ◽

Chuan-Pu Liu ◽

Ying-Lang Wang

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous ◽

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High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits

IBM Journal of Research and Development ◽

10.1147/rd.431.0109 ◽

1999 ◽

Vol 43 (1.2) ◽

pp. 109-126 ◽

Author(s):

S. V. Nguyen

Keyword(s):

Chemical Vapor Deposition ◽

Integrated Circuits ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Dielectric Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silicon Based ◽

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Method for angular sputter yield extraction for high-density plasma chemical vapor deposition simulators

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590020 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1123 ◽

Author(s):

P. Kapur

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Sputter Yield ◽

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Mechanism of high density plasma chemical vapor deposition phosphosilicate glass process without in-situ plasma chamber clean

Thin Solid Films ◽

10.1016/j.tsf.2004.06.193 ◽

2004 ◽

Vol 469-470 ◽

pp. 438-443 ◽

Author(s):

Jin Kun Lan ◽

Y.L. Wang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Phosphosilicate Glass ◽

Glass Process ◽

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Alkylation of nanoporous silica thin films by high density plasma chemical vapor deposition of a-SiC:H

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1738668 ◽

2004 ◽

Vol 22 (3) ◽

pp. 1067 ◽

Author(s):

F. M. Pan ◽

B. W. Wu ◽

A. T. Cho ◽

K. C. Tsai ◽

T. G. Tsai ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Nanoporous Silica ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Silica Thin Films ◽

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Device Damage During Low Temperature High-Density Plasma Chemical Vapor Deposition

Handbook of Advanced Plasma Processing Techniques ◽

10.1007/978-3-642-56989-0_14 ◽

2000 ◽

pp. 575-605

Author(s):

J. Lee ◽

F. Ren

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Cleaning process in high density plasma chemical vapor deposition

10.17918/etd-344 ◽

2021 ◽

Author(s):

Kamilla Iskenderova

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Cleaning Process ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Structural Analysis for Water Absorption of SiOF Films Prepared by High-Density-Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.2411 ◽

1998 ◽

Vol 37 (Part 1, No. 5A) ◽

pp. 2411-2415 ◽

Author(s):

Takahiro Tamura ◽

Junro Sakai ◽

Yoichi Inoue ◽

Makoto Satoh ◽

Hikaru Yoshitaka

Keyword(s):

Chemical Vapor Deposition ◽

Structural Analysis ◽

Water Absorption ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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