Comparative evaluation of electron-beam sensitive single layer top surface imaging and bilayer chemical amplification of resist lines process for stencil mask making

1999 ◽  
Vol 17 (6) ◽  
pp. 3122 ◽  
Author(s):  
K. Elian ◽  
M. Irmscher ◽  
J. Butschke ◽  
F. Letzkus ◽  
C. Reuter ◽  
...  
Keyword(s):  
Electron Beam ◽  
Comparative Evaluation ◽  
Single Layer ◽  
Surface Imaging ◽  
Chemical Amplification ◽  
Mask Making ◽  
Stencil Mask ◽  
Top Surface Imaging

Defect Agglomeration and Electron-Beam-Induced Local-Phase Transformations in Single-Layer MoTe2

2021 ◽  
Author(s):  
Janis Köster ◽  
Mahdi Ghorbani-Asl ◽  
Hannu-Pekka Komsa ◽  
Tibor Lehnert ◽  
Silvan Kretschmer ◽  
...  
Keyword(s):  
Electron Beam ◽  
Phase Transformations ◽  
Single Layer ◽  
Local Phase

Characterization of Glass-Ceramics by TEM

2013 ◽  
Vol 562-565 ◽  
pp. 809-812 ◽  
Author(s):  
Xiao Qing Liu ◽  
Jun Lin Xie ◽  
Feng He ◽  
Hu Yang
Keyword(s):  
Electron Beam ◽  
Carbon Film ◽  
Glass Ceramics ◽  
Single Layer ◽  
Double Layers ◽  
Characterization Technique

The characterization technique of glass-ceramics by TEM was discussed by comparing the effects of single layer carbon film technique and double layers carbon film technique on the microstructure of Li-Al-Si glass-ceramics. The results show that double layers carbon film technique can improve glass-ceramics sample’s conductivity, reduce the induction of elctron beam on glass-ceramics, and avoid the temperature increasing of glass-ceramics particles caused by the charges aggregation on the particles’ surface when TEM electron beam hit down, prevent glass-ceramics from crystallization and the transformation of microstructurec. So, compared with single layer carbon film technique, double layers carbon film technique is more suitable for the research of microsture of glass-ceramics by TEM.

A Study of the O2-SO2Plasma Etch Chemistry for Top Surface Imaging Photoresist Dry Development

1998 ◽  
Vol 37 (Part 1, No. 4B) ◽  
pp. 2373-2380 ◽  
Author(s):  
Z. S. Huang ◽  
Yosias Melaku ◽  
Wendy Nguyen
Keyword(s):  
Surface Imaging ◽  
Top Surface Imaging

Development of single-layer positive resist process for electron beam direct writing technology

1995 ◽  
Vol 78 (8) ◽  
pp. 81-91 ◽  
Author(s):  
Hidenori Yamaguchi ◽  
Toshio Sakamizu ◽  
Fumio Murai ◽  
Hiroshi Shiraishi ◽  
Hajime Hayakawa ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Layer ◽  
Direct Writing ◽  
Writing Technology ◽  
Positive Resist
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