Molecular beam epitaxy growth of low-bandgap material thick films using a molybdenum disilicide coated backing plate for substrate temperature control

Author(s):  
Adrian Podpirka ◽  
Michael Brupbacher ◽  
Christine Zgrabik ◽  
Jarod C. Gagnon ◽  
David Shrekenhamer
2000 ◽  
Vol 648 ◽  
Author(s):  
Z. Zhang ◽  
B. G. Orr

AbstractNumerical simulations have been performed for generic III-V MBE growth. The key aspects of the simulation include two deposited species one volatile and the second with high surface mobility. Simulations reproduce the experimentally observed adatom concentrations for GaAs and show that smooth surfaces are produced for films deposited with a substrate temperature in a crossover regime between kinetically limited and entropically roughened growth.


1995 ◽  
Vol 150 ◽  
pp. 54-61 ◽  
Author(s):  
F.G. Boebel ◽  
H. Möller ◽  
B. Hertel ◽  
H. Grothe ◽  
G. Schraud ◽  
...  

2007 ◽  
Vol 102 (8) ◽  
pp. 083536 ◽  
Author(s):  
V. Novák ◽  
K. Olejník ◽  
M. Cukr ◽  
L. Smrčka ◽  
Z. Remeš ◽  
...  

2015 ◽  
Vol 86 (1) ◽  
pp. 014904 ◽  
Author(s):  
T. Hutchins ◽  
M. Nazari ◽  
M. Eridisoorya ◽  
T. M. Myers ◽  
M. Holtz

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