Enhanced radiative recombination probability in AlGaN quantum wires on (0001) vicinal surface

Author(s):  
Minehiro Hayakawa ◽  
Yuki Hayashi ◽  
Shuhei Ichikawa ◽  
Mitsuru Funato ◽  
Yoichi Kawakami
Author(s):  
Vurgaftman Igor

This chapter shows how to calculate the absorption coefficient, optical gain, and radiative recombination rates in quantum wells and superlattices. A detailed treatment of both interband and intersubband transitions is presented, and their differences and similarities are considered in detail. The optical properties of wurtzite quantum wells and zinc-blende quantum wires and dots are also discussed. Finally, the interaction of excitonic transitions with incident light in quantum wells is considered as a model for other two-dimensional materials.


1994 ◽  
Vol 37 (4-6) ◽  
pp. 1097-1100 ◽  
Author(s):  
M. Grundmann ◽  
V. Tuerck ◽  
J. Christen ◽  
E. Kapon ◽  
D.M. Hwang ◽  
...  

1979 ◽  
Vol 34 (5) ◽  
pp. 656-658 ◽  
Author(s):  
Th. Wasserrab

Abstract In 1974 a theory of the radiative recombination including the Coulomb interaction and the exciton recombination was published by Schlangenotto et al. Now, a quantitative evaluation of this theory was carried out for Si: it shows a strong enhancement of the recombination probability, compared with the theory of van Roosbroeck and Shockley, and yields a remarkable agreement with the measurements.


1978 ◽  
Vol 33 (9) ◽  
pp. 1097-1098 ◽  
Author(s):  
Th. Wasserrab

Quantitative calculations of Varshni, using the theory of radiative recombination of van Roosbroeck and Shock- ley yielded a slight increase of the recombination probabi­lity B with temperture T. Measurement of Schlangenotto et al demonstrated in contrast a strong decrease of B with T. It is pointed out, that this discrepancy is only a conse­quence of using approximative ni values (intrinsic carrier concentration) by Varshni. Introduction of new, corrected data of ni yields now a remarcable agreement between calculation and measurement.


1988 ◽  
Vol 102 ◽  
pp. 47-50
Author(s):  
K. Masai ◽  
S. Hayakawa ◽  
F. Nagase

AbstractEmission mechanisms of the iron Kα-lines in X-ray binaries are discussed in relation with the characteristic temperature Txof continuum radiation thereof. The 6.7 keV line is ascribed to radiative recombination followed by cascades in a corona of ∼ 100 eV formed above the accretion disk. This mechanism is attained for Tx≲ 10 keV as observed for low mass X-ray binaries. The 6.4 keV line observed for binary X-ray pulsars with Tx> 10 keV is likely due to fluorescence outside the He II ionization front.


Author(s):  
S. Hillyard ◽  
Y.-P. Chen ◽  
J.D. Reed ◽  
W.J. Schaff ◽  
L.F. Eastman ◽  
...  

The positions of high-order Laue zone (HOLZ) lines in the zero order disc of convergent beam electron diffraction (CBED) patterns are extremely sensitive to local lattice parameters. With proper care, these can be measured to a level of one part in 104 in nanometer sized areas. Recent upgrades to the Cornell UHV STEM have made energy filtered CBED possible with a slow scan CCD, and this technique has been applied to the measurement of strain in In0.2Ga0.8 As wires.Semiconductor quantum wire structures have attracted much interest for potential device applications. For example, semiconductor lasers with quantum wires should exhibit an improvement in performance over quantum well counterparts. Strained quantum wires are expected to have even better performance. However, not much is known about the true behavior of strain in actual structures, a parameter critical to their performance.


Author(s):  
A. Carlsson ◽  
J.-O. Malm ◽  
A. Gustafsson

In this study a quantum well/quantum wire (QW/QWR) structure grown on a grating of V-grooves has been characterized by a technique related to chemical lattice imaging. This technique makes it possible to extract quantitative information from high resolution images.The QW/QWR structure was grown on a GaAs substrate patterned with a grating of V-grooves. The growth rate was approximately three monolayers per second without growth interruption at the interfaces. On this substrate a barrier of nominally Al0.35 Ga0.65 As was deposited to a thickness of approximately 300 nm using metalorganic vapour phase epitaxy . On top of the Al0.35Ga0.65As barrier a 3.5 nm GaAs quantum well was deposited and to conclude the structure an additional approximate 300 nm Al0.35Ga0.65 As was deposited. The GaAs QW deposited in this manner turns out to be significantly thicker at the bottom of the grooves giving a QWR running along the grooves. During the growth of the barriers an approximately 30 nm wide Ga-rich region is formed at the bottom of the grooves giving a Ga-rich stripe extending from the bottom of each groove to the surface.


1998 ◽  
Vol 184-185 (1-2) ◽  
pp. 339-342 ◽  
Author(s):  
L Parthier
Keyword(s):  

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