Industrial photoresist development with the EUV laboratory exposure tool: mask fabrication, sensitivity and contrast

2019 ◽  
Author(s):  
Sascha Brose ◽  
Serhiy Danylyuk ◽  
Franziska Grüneberger ◽  
Maik Gerngross ◽  
Jochen Stollenwerk ◽  
...  
Keyword(s):  
Laboratory Exposure ◽  
Mask Fabrication

A study of proximity effects at high electron-beam voltages for x-ray mask fabrication part 1: Additive mask processes

1991 ◽  
Vol 13 (1-4) ◽  
pp. 165-172 ◽  
Author(s):  
M.G. Rosenfield ◽  
S.A. Rishton ◽  
D.P. Kern ◽  
D.E. Seeger ◽  
C.A. Whiting
Keyword(s):  
Electron Beam ◽  
Proximity Effects ◽  
High Electron ◽  
X Ray ◽  
Mask Fabrication

Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication

2009 ◽  
Author(s):  
Ryoichi Hirano ◽  
Masatoshi Hirono ◽  
Riki Ogawa ◽  
Nobutaka Kikuiri ◽  
Kenichi Takahara ◽  
...  
Keyword(s):  
Super Resolution ◽  
Next Generation ◽  
Resolution Method ◽  
Mask Inspection ◽  
Mask Fabrication

Preliminary study of 65 nm node alternating phase-shift mask fabrication

2002 ◽  
Author(s):  
Kouji Hosono ◽  
Naoyuki Ishiwata ◽  
Satoru Asai ◽  
Hiroshi Maruyama ◽  
Yutaka Miyahara ◽  
...  
Keyword(s):  
Phase Shift ◽  
Preliminary Study ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask ◽  
Mask Fabrication

Progressive defects caused by crosstalk between mask fabrication processes

2013 ◽  
Author(s):  
Jongkeun Oh ◽  
Junyeol Choi ◽  
Jaehyuck Choi ◽  
Han-shin Lee ◽  
Hyungho Koh ◽  
...  
Keyword(s):  
Mask Fabrication

Effect of beam blur in mask fabrication

2001 ◽  
Author(s):  
Seung-Hune Yang ◽  
Won-Tai Ki ◽  
Seong-Yong Moon ◽  
Tae Moon Jeong ◽  
Seong-Woon Choi ◽  
...  
Keyword(s):  
Mask Fabrication

Interferometric investigation of x-ray mask fabrication distortions

1994 ◽  
Author(s):  
Matthew E. Hansen ◽  
Roxann L. Engelstad ◽  
Michael T. Reilly ◽  
Frederick T. Moore
Keyword(s):  
X Ray ◽  
Interferometric Investigation ◽  
Mask Fabrication

Pattern-data preparation method to enhance high-throughput mask fabrication in variable-shaped e-beam writing system

1996 ◽  
Author(s):  
Shigehiro Hara ◽  
Eiji Murakami ◽  
Shunko Magoshi ◽  
Kiyomi Koyama ◽  
Hirohito Anze ◽  
...  
Keyword(s):  
High Throughput ◽  
Preparation Method ◽  
Writing System ◽  
Data Preparation ◽  
Mask Fabrication
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