Improving the ion current density distribution from a gridless ion source by optimizing the orientation

1999 ◽  
Author(s):  
Henrik Fabricius
Keyword(s):  
Density Distribution ◽  
Current Density ◽  
Current Density Distribution ◽  
Ion Source ◽  
Ion Current ◽  
Ion Current Density

scholarly journals Ion current density distribution in a pulsed non-self-sustained glow discharge with a large hollow cathode

2017 ◽  
Vol 927 ◽  
pp. 012014 ◽  
Author(s):  
V V Denisov ◽  
S S Kovalsky ◽  
N N Koval ◽  
I V Lopatin ◽  
E V Ostroverkhov ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Density Distribution ◽  
Current Density ◽  
Hollow Cathode ◽  
Current Density Distribution ◽  
Ion Current ◽  
Ion Current Density

The Ion Current Density on the Surface of a Spherical Probe in a Flowing High Pressure Plasma

1974 ◽  
Vol 52 (12) ◽  
pp. 1057-1062 ◽  
Author(s):  
C. S. MacLatchy ◽  
P. C. Budgel ◽  
J. R. Miner
Keyword(s):  
Current Density ◽  
Current Density Distribution ◽  
Boundary Layer Separation ◽  
Ion Current ◽  
Spherical Probe ◽  
Fluid Behavior ◽  
Real Fluid ◽  
Flame Plasma ◽  
Schlieren Photography ◽  
Ion Current Density

The positive ion current density on the surface of a spherical probe immersed in a flowing flame plasma has been measured under thin sheath conditions. The hydrodynamic Reynolds number ranged from 96 to 720. No pronounced real fluid effects have been observed in the current density although the probe is observed by Schlieren photography to exhibit boundary layer separation and wake formation. In spite of the real fluid behavior of the plasma fluid, the thin sheath theory describes the current density distribution on the probe surface very effectively. This is attributed to the formation and entrainment of a shielding layer of fluid, voided of charge during its passage through the sheath.

Beam current density distribution of a vacuum arc ion source

1998 ◽  
Vol 69 (2) ◽  
pp. 807-809 ◽  
Author(s):  
A. G. Nikolaev ◽  
E. M. Oks ◽  
Xiaoji Zhang ◽  
Cheng Cheng
Keyword(s):  
Density Distribution ◽  
Current Density ◽  
Current Density Distribution ◽  
Beam Current ◽  
Ion Source ◽  
Vacuum Arc ◽  
Beam Current Density

Metal Vapour Vacuum Arc Ion Source to Synthesize Refractory Metal Silicides

1993 ◽  
Vol 316 ◽  
Author(s):  
B.X. Liu ◽  
D.H. Zhu ◽  
H.B. Lu ◽  
K. Tao
Keyword(s):  
Current Density ◽  
Refractory Metal ◽  
Metal Ion ◽  
High Current Density ◽  
Ion Source ◽  
Ion Current ◽  
Vacuum Arc ◽  
Metal Vapour ◽  
Metal Silicides ◽  
Ion Current Density

ABSTRACTMetal Vapour Vacuum Arc (MEWA) Ion Source was employed, for the first time, to synthesize metal suicides. Refractory metal suicides NbSi2, TaSi2, WSi2 and MoSi2 were successfully formed by implanting respective metal ions into Si(111) wafers. It was found that the high current density metal ion implantation not only provided the metal components but also caused a simultaneous annealing for various metal-suicide phases to grow. When the impLantation was conducted at 40 kV, the Nb ion current density was up to 76 µA/cm2 at a dose of 4x1017/cm 2, and the Ta, W and Mo ion current densities were up to 65 µA/cm2 at a dose of 5×1017 ions/cm2 , hexagonal NbSi2, TaSi2, MoSi2 and WSi2 were formed. Post annealing transformed the WSi2 and MoSi2 phases from hexagonal to tetragonal structure, featuring lower resistance than that of the as-implanted ones.

Ion current density profile control of a scalable linear ion source and its application

2006 ◽  
Vol 77 (3) ◽  
pp. 03C107 ◽  
Author(s):  
F. Scholze ◽  
H. Neumann ◽  
M. Tartz ◽  
J. Dienelt ◽  
H. Schlemm
Keyword(s):  
Density Profile ◽  
Current Density ◽  
Ion Source ◽  
Ion Current ◽  
Profile Control ◽  
Current Density Profile ◽  
Ion Current Density
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