Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography

1999 ◽  
Author(s):  
Nobuhiko Fukuhara ◽  
Takashi Haraguchi ◽  
Koichiro Kanayama ◽  
Tadashi Matsuo ◽  
Susumu Takeuchi ◽  
...  
Keyword(s):  
Phase Shift ◽  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser ◽  
Phase Shift Mask

Fabrication of 0.1 µm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7488-7493 ◽  
Author(s):  
Keisuke Nakazawa ◽  
Masaya Uematsu ◽  
Toshio Onodera ◽  
Kazuya Kamon ◽  
Tohru Ogawa ◽  
...  
Keyword(s):  
Phase Shift ◽  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

scholarly journals Resists Using the Absorption Band Shift Method for ArF Excimer Laser Lithography.

1998 ◽  
Vol 11 (3) ◽  
pp. 489-492
Author(s):  
Takeshi Okino ◽  
Koji Asakawa ◽  
Naomi Shida ◽  
Tohru Ushirogouchi
Keyword(s):  
Absorption Band ◽  
Excimer Laser ◽  
Band Shift ◽  
Shift Method ◽  
Laser Lithography ◽  
Arf Excimer Laser

ArF excimer laser lithography with bottom antireflective coating

1998 ◽  
Author(s):  
Shinji Kishimura ◽  
Makoto Takahashi ◽  
Keisuke Nakazawa ◽  
Takeshi Ohfuji ◽  
Masaru Sasago ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Antireflective Coating ◽  
Laser Lithography ◽  
Arf Excimer Laser

Dissolution behavior of alicyclic polymers designed for ArF excimer laser lithography

1996 ◽  
Author(s):  
Takeshi Ohfuji ◽  
Katsumi Maeda ◽  
Kaichiro Nakano ◽  
Etsuo Hasegawa
Keyword(s):  
Excimer Laser ◽  
Dissolution Behavior ◽  
Laser Lithography ◽  
Arf Excimer Laser
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