Comparison of chemical effects of UV radiation from spark discharge in air and a low-pressure mercury lamp

2013 ◽  
Vol 47 (5) ◽  
pp. 247-250 ◽  
Author(s):  
I. M. Piskarev ◽  
I. P. Ivanova ◽  
S. V. Trofimova
2007 ◽  
Author(s):  
Sergey M. Avdeev ◽  
Edward A. Sosnin ◽  
Ksenia Y. Velichevskaya ◽  
Larisa V. Lavrent'eva

1979 ◽  
Vol 28 (2) ◽  
pp. 202-206 ◽  
Author(s):  
K.J. Witte ◽  
P. Burkhard ◽  
H.R. Lüthi

1986 ◽  
Vol 75 ◽  
Author(s):  
C. Fuchs ◽  
E. Fogarassy

AbstractWe compare, in this study, the photoassisted processes for silicon deposition using both a low pressure mercury lamp and an ArF excimer laser for the specific case where the SiH4 gas is sealed in the reaction chamber.


Author(s):  
Blanka Galbičková ◽  
Maroš Soldán ◽  
Michal Belčík ◽  
Karol Balog

Abstract Utilization of AOPs (Advanced oxidation processes) as an emerging technology for removing of pollutants from wastewater is developed. In this paper, UV photodegradation was used for removing of phenol from wastewater. As a source of UV radiation medium pressure mercury lamp with output 400W was used. The influence of low-cost catalysts on this process was also monitored. Wastes from metal production, red mud and black nickel mud, were used as catalysts.


Author(s):  
A.C. Fozza ◽  
J. Roch ◽  
J.E. Klemberg-Sapieha ◽  
A. Kruse ◽  
A. Holländer ◽  
...  

2009 ◽  
Vol 421-422 ◽  
pp. 91-94 ◽  
Author(s):  
Kazuyuki Suzuki ◽  
Kazumi Kato

The HfO2 films prepared from alkoxy-derived precursor solution chemically modified with diethanolamine. The effects of UV irradiation on the HfO2 films were investigated. The UV irradiation using low pressure mercury lamp (LPML) was effective for the organics decomposition in the film and densification. The uniform and smooth HfO2 films were obtained. The refractive index of HfO2 films was enhanced.


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