CHARGE TRANSFER IN THE RADIOLYSIS OF BINARY HYDROCARBON MIXTURES

1966 ◽  
Vol 44 (10) ◽  
pp. 1175-1182 ◽  
Author(s):  
J. A. Stone ◽  
A. R. Quirt ◽  
O. A. Miller
Keyword(s):  
Charge Transfer ◽  
Ionization Potential ◽  
Ionization Potentials ◽  
Liquid Hydrocarbons ◽  
General Phenomenon ◽  
Saturated Hydrocarbons ◽  
Hydrocarbon Mixtures ◽  
Solvent Interaction ◽  
Lower Ionization Potential ◽  
Solute Solvent Interaction

The radiolysis of dilute solutions of ethane-dε, propane-d8, and n-butane-d10 in liquid hydrocarbons at 195 °K results in the production of D2 and HD in amounts which are determined by the relative ionization potentials of solvent and solute. Solvents of higher ionization potential enhance the production of D2 and HD from deuterated solutes of lower ionization potential. When the ionization potentials are in the reverse order the yields are diminished. This solute–solvent interaction, which is ionic in nature, is a general phenomenon in the radiolysis of mixtures of saturated hydrocarbons in the liquid phase and is consistent with charge transfer between solvent and solute.

The formation and reactions of aromatic dimer cations in a high pressure photoionization source

1980 ◽  
Vol 58 (16) ◽  
pp. 1666-1672 ◽  
Author(s):  
John A. Stone ◽  
Margaret S. Lin
Keyword(s):  
High Pressure ◽  
Charge Transfer ◽  
Ionization Potential ◽  
Rate Constants ◽  
Aromatic Compounds ◽  
Third Order ◽  
Order Rate ◽  
Lower Ionization Potential ◽  
The Difference

Aromatic dimer cations (M2+) have been generated for a series of aromatic compounds in a high pressure photoionization source. Relative third order rate constants for formation of M2+ have been obtained for benzene (1.0), benzene-d6 (2.7), toluene (0.8), o-xylene (1.5), p-xylene (0.7), fluorobenzene (0.3), m-fluorotoluene (0.5), m-chlorotoluene (0.7), p-chlorotoluene (0.5), and o-methoxytoluene (0.4). These values are consistent with and supplement previous data for such systems. Reagent ion monitoring has been used to determine the relative rates of reaction of both M2+ and the monomer ions, M+, with a series of (mainly) aromatic compounds (X). Reaction of C6H6+ is by charge transfer to compounds of lower ionization potential than C6H6. (C6H6)2+ reacts only by charge transfer, if the ionization potential of X is more than 0.5 eV lower than that of benzene. When the difference is smaller, mixed dimer cations are observed which are probably formed in a switching reaction (C6H6)2+ + X → (C6H6•X)+ + C6H6.

Impacts of Ionization Potentials and Megasonic Dispersion

2009 ◽  
Vol 145-146 ◽  
pp. 19-22 ◽  
Author(s):  
Cole Franklin
Keyword(s):  
Ionization Potential ◽  
Semiconductor Devices ◽  
Ionization Potentials ◽  
Bulk Liquid ◽  
Bubble Collapse ◽  
Available Energy ◽  
Lower Ionization Potential ◽  
The Impact

It has been shown that megasonics can accelerate strip processes such as doped and plasma treated photoresist [1]. However, applied megasonic energy can also damage sensitive semiconductor devices. It was shown that adding a solvent such as IPA or lowering the temperature helps to control cavitation in semi-aqueous fluids [2]. Sonochemical reactions have been observed in various industries, however, there are no published observations in semiconductor cleaning. Ions may form in megasonic driven bubble collapse impacted by the characteristics of a gas or liquid that enters the bubble from the bulk liquid. Lower ionization potential gases or liquids may form ions earlier in the bubble collapse, so as to use up some of the total available energy through sonochemical reactions and possibly reducing the cavitations implosive energy. Here, tests are conducted to vary the liquid and gas type based on ionization potential to look into the impact this would have on cleaning and damage. It is shown that lower ionization or liquid additives lower the device damage.

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