Three-dimensional Monte Carlo simulations of materials on the physical deposition process
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The sputtering technique is largely used for the deposition of thin layers. In this study, the Monte Carlo (MC) method combined with the binary collision theory of hard spheres is used to simulate the energy, direction and topology of the film deposit. The effects of several parameters such as the substrate, target, pressure and the distance between substrate and target were analyzed. Our results showed that for large pressures or distances, energy and angular distributions are uniform and consequently the obtained film will be uniform. The obtained results are in agreement with other works, which validates our calculations.
1994 ◽
Vol 45
(2)
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pp. 261-266
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1982 ◽
Vol 198
(2-3)
◽
pp. 399-402
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2019 ◽
Vol 60
(3)
◽
pp. 1227-1244
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