THE APPLICATION OF SCANNING PHOTOELECTRON MICROSCOPY OF THE PLS (POHANG LIGHT SOURCE) TO INVESTIGATION OF SEMICONDUCTOR DEVICES

2002 ◽  
Vol 09 (01) ◽  
pp. 497-501 ◽  
Author(s):  
M. K. LEE ◽  
H. J. SHIN ◽  
G. B. KIM ◽  
C. K. HONG ◽  
O. H. KIM ◽  
...  
Keyword(s):  
Light Source ◽  
Photoelectron Spectroscopy ◽  
Line Shift ◽  
Sensor Chip ◽  
Conducting Layer ◽  
Si Substrate ◽  
X Ray ◽  
Semiconductor Sensor ◽  
Pohang Light Source ◽  
Scanning Photoelectron Microscopy

Scanning photoelectron microscopy (SPEM) was used to investigate a semiconductor sensor chip and Cu patterns embedded in Si substrate. It was found that the line shift in X-ray photoelectron spectroscopy (XPS) caused by local charges on the passivated surface is proportional to the distance between the surface and the conducting layer of the sensor chip. By using the line shift in XPS, inner-layered microstructure of the sensor chip could be imaged without destroying the sample. The result for the Cu patterns indicates that the surface of Cu patterns is more contaminated with carbon in the air than the surface of the Si pattern.

scholarly journals New ambient pressure X-ray photoelectron spectroscopy endstation at Taiwan light source

2019 ◽  
Author(s):  
Chia-Hsin Wang ◽  
Sun-Tang Chang ◽  
Sheng-Yuan Chen ◽  
Yaw-Wen Yang
Keyword(s):  
Light Source ◽  
Photoelectron Spectroscopy ◽  
Ambient Pressure ◽  
X Ray

scholarly journals Fabrication of PMMA X-ray Compound Refractive Lenses for the Pohang Light Source and Performance Tests

2007 ◽  
Vol 51 (4) ◽  
pp. 1256 ◽  
Author(s):  
Guk Bae Kim ◽  
Sang Joon Lee ◽  
Jin Pyung Lee ◽  
Jong Hyun Kim ◽  
Suk Sang Chang ◽  
...  
Keyword(s):  
Light Source ◽  
Performance Tests ◽  
X Ray ◽  
Pohang Light Source ◽  
And Performance

Note: Construction of x-ray scattering and x-ray absorption fine structure beamline at the Pohang Light Source

2010 ◽  
Vol 81 (2) ◽  
pp. 026103 ◽  
Author(s):  
Ik-Jae Lee ◽  
Chung-Jong Yu ◽  
Young-Duck Yun ◽  
Chae-Soon Lee ◽  
In Deuk Seo ◽  
...  
Keyword(s):  
Fine Structure ◽  
Light Source ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Scattering ◽  
Pohang Light Source ◽  
X Ray Absorption ◽  
Ray Scattering

A scanning transmission X-ray microscope at the Pohang Light Source

2018 ◽  
Vol 25 (3) ◽  
pp. 878-884 ◽  
Author(s):  
Hyun-Joon Shin ◽  
Namdong Kim ◽  
Hee-Seob Kim ◽  
Wol-Woo Lee ◽  
Chae-Soon Lee ◽  
...  
Keyword(s):  
Energy Range ◽  
Light Source ◽  
Photon Energy ◽  
Chemical State ◽  
Photon Energy Range ◽  
X Rays ◽  
X Ray ◽  
Space Resolution ◽  
Scanning Transmission ◽  
Pohang Light Source

A scanning transmission X-ray microscope is operational at the 10A beamline at the Pohang Light Source. The 10A beamline provides soft X-rays in the photon energy range 100–2000 eV using an elliptically polarized undulator. The practically usable photon energy range of the scanning transmission X-ray microscopy (STXM) setup is from ∼150 to ∼1600 eV. With a zone plate of 25 nm outermost zone width, the diffraction-limited space resolution, ∼30 nm, is achieved in the photon energy range up to ∼850 eV. In transmission mode for thin samples, STXM provides the element, chemical state and magnetic moment specific distributions, based on absorption spectroscopy. A soft X-ray fluorescence measurement setup has been implemented in order to provide the elemental distribution of thicker samples as well as chemical state information with a space resolution of ∼50 nm. A ptychography setup has been implemented in order to improve the space resolution down to 10 nm. Hardware setups and application activities of the STXM are presented.

scholarly journals Photoelectron and X-ray Absorption Spectroscopy of Pu

2003 ◽  
Vol 802 ◽  
Author(s):  
J. G. Tobin ◽  
B. Chung ◽  
R. K. Schulze ◽  
J. D. Farr ◽  
D. K. Shuh
Keyword(s):  
Light Source ◽  
Absorption Spectroscopy ◽  
Photoelectron Spectroscopy ◽  
Future Studies ◽  
X Ray ◽  
Advanced Light Source ◽  
First Results ◽  
X Ray Absorption

ABSTRACTWe have performed Photoelectron Spectroscopy and X-Ray Absorption Spectroscopy upon highly radioactive samples of Plutonium at the Advanced Light Source in Berkeley, CA, USA. First results from alpha and delta Plutonium are reported as well as plans for future studies of actinide studies.

Determination of the Thickness of Sio2-Layers on Si by X-Ray Analysis and by X-Ray Photoelectron Spectroscopy

1979 ◽  
Vol 23 ◽  
pp. 223-230
Author(s):  
Maria F. Ebel ◽  
H. Ebel ◽  
J. Wernisch
Keyword(s):  
Photoelectron Spectroscopy ◽  
Count Rate ◽  
Silicon Wafers ◽  
Electron Spectrometer ◽  
Si Substrate ◽  
Oxide Layers ◽  
X Ray ◽  
Information Depth ◽  
Pass Through

It is feasible to investigate the thickness of oxide layers on silicon wafers by X-radiation in the 0.1-10 nm thickness range. For example, X-ray photoelectron spectroscopy (XPS) is a well applicable technique, with information depth of a few nm. Fig. 1 presents the principle of this method. An impinging characteristic X-radiation hν (e.g. Al Kα) count rate ejects Si 2p photoelectrons from the Si-substrate (d), with count rate n2, which, on their way to the electron spectrometer, have to pass through the SiOx-interface (c), the SiO2-layer (b) and the contamination overlayer (a), whereas Si 2p photoelectrons ejected from the SiO2-layer, with count rate n2 have just to penetrate the contamination overlayer. The Si 2p electrons originating from the SiOx-interface, for the situation shown in Fig. 1, can be added to the substrate count rate.

scholarly journals On the electronic configuration in Pu

2006 ◽  
Vol 986 ◽  
Author(s):  
J G Tobin ◽  
P Soderlind ◽  
A Landa ◽  
K T Moore ◽  
A J Schwartz ◽  
...  
Keyword(s):  
Detailed Analysis ◽  
Light Source ◽  
Absorption Spectroscopy ◽  
Photoelectron Spectroscopy ◽  
Electronic Configuration ◽  
X Ray ◽  
Sample Quality ◽  
Advanced Light Source ◽  
First Results ◽  
X Ray Absorption

AbstractX-Ray Absorption Spectroscopy (XAS) and Photoelectron Spectroscopy (PES) have been performed upon highly radioactive samples, particularly Plutonium, at the Advanced Light Source in Berkeley, CA, USA. First results from alpha and delta Plutonium are reported as well as a detailed analysis of sample quality.

scholarly journals Surface science at the PEARL beamline of the Swiss Light Source

2017 ◽  
Vol 24 (1) ◽  
pp. 354-366 ◽  
Author(s):  
Matthias Muntwiler ◽  
Jun Zhang ◽  
Roland Stania ◽  
Fumihiko Matsui ◽  
Peter Oberta ◽  
...  
Keyword(s):  
Light Source ◽  
Surface Science ◽  
Photoelectron Spectroscopy ◽  
Hexagonal Boron Nitride ◽  
Real Space ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
X Ray ◽  
Photoelectron Diffraction ◽  
Swiss Light Source

The Photo-Emission and Atomic Resolution Laboratory (PEARL) is a new soft X-ray beamline and surface science laboratory at the Swiss Light Source. PEARL is dedicated to the structural characterization of local bonding geometry at surfaces and interfaces of novel materials, in particular of molecular adsorbates, nanostructured surfaces, and surfaces of complex materials. The main experimental techniques are soft X-ray photoelectron spectroscopy, photoelectron diffraction, and scanning tunneling microscopy (STM). Photoelectron diffraction in angle-scanned mode measures bonding angles of atoms near the emitter atom, and thus allows the orientation of small molecules on a substrate to be determined. In energy scanned mode it measures the distance between the emitter and neighboring atoms; for example, between adsorbate and substrate. STM provides complementary, real-space information, and is particularly useful for comparing the sample quality with reference measurements. In this article, the key features and measured performance data of the beamline and the experimental station are presented. As scientific examples, the adsorbate–substrate distance in hexagonal boron nitride on Ni(111), surface quantum well states in a metal-organic network of dicyano-anthracene on Cu(111), and circular dichroism in the photoelectron diffraction of Cu(111) are discussed.

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