Enhanced terahertz detection of multigate graphene nanostructures

Terahertz (THz) waves have revealed a great potential for use in various fields and for a wide range of challenging applications. High-performance detectors are, however, vital for exploitation of THz technology. Graphene plasmonic THz detectors have proven to be promising optoelectronic devices, but improving their performance is still necessary. In this work, an asymmetric-dual-grating-gate graphene-terahertz-field-effect-transistor with a graphite back-gate was fabricated and characterized under illumination of 0.3 THz radiation in the temperature range from 4.5 K up to the room temperature. The device was fabricated as a sub-THz detector using a heterostructure of h-BN/Graphene/h-BN/Graphite to make a transistor with a double asymmetric-grating-top-gate and a continuous graphite back-gate. By biasing the metallic top-gates and the graphite back-gate, abrupt n+n (or p+p) or np (or pn) junctions with different potential barriers are formed along the graphene layer leading to enhancement of the THz rectified signal by about an order of magnitude. The plasmonic rectification for graphene containing np junctions is interpreted as due to the plasmonic electron-hole ratchet mechanism, whereas, for graphene with n+n junctions, rectification is attributed to the differential plasmonic drag effect. This work shows a new way of responsivity enhancement and paves the way towards new record performances of graphene THz nano-photodetectors.

Vertical nanowire/nanosheet FETs with a horizontal channel for threshold voltage modulation

A new type of vertical nanowire (VNW)/nanosheet (VNS) FETs combining a horizontal channel (HC) with bulk/back-gate electrode configuration, including Bulk-HC and FD-SOI-HC VNWFET, is proposed and investigated by TCAD simulation. Comparisons were carried out between conventional VNWFET and the proposed devices. FD-SOI-HC VNWFET exhibits better I on/I off ratio and DIBL than Bulk-HC VNWFET. The impact of channel doping and geometric parameters on the electrical characteristic and body factor (γ) of the devices was investigated. Moreover, threshold voltage modulation by bulk/back-gate bias was implemented and a large γ is achieved for wide range V th modulation. In addition, results of I on enhancement and I off reduction indicate the proposed devices are promising candidates for performance and power optimization of NW/NS circuits by adopting dynamic threshold voltage management. The results of preliminary experimental data are discussed as well.

Modeling of Gate Tunable Synaptic Device for Neuromorphic Applications

The emerging memories are great candidates to establish neuromorphic computing challenging non-Von Neumann architecture. Emerging non-volatile resistive random-access memory (RRAM) attracted abundant attention recently for its low power consumption and high storage density. Up to now, research regarding the tunability of the On/Off ratio and the switching window of RRAM devices remains scarce. In this work, the underlying mechanisms related to gate tunable RRAMs are investigated. The principle of such a device consists of controlling the filament evolution in the resistive layer using graphene and an electric field. A physics-based stochastic simulation was employed to reveal the mechanisms that link the filament size and the growth speed to the back-gate bias. The simulations demonstrate the influence of the negative gate voltage on the device current which in turn leads to better characteristics for neuromorphic computing applications. Moreover, a high accuracy (94.7%) neural network for handwritten character digit classification has been realized using the 1-transistor 1-memristor (1T1R) crossbar cell structure and our stochastic simulation method, which demonstrate the optimization of gate tunable synaptic device.

Super-Nernstian ion sensitive field-effect transistor exploiting charge screening in WSe2/MoS2 heterostructure

Ion-sensitive field-effect transistors (ISFETs) have gained a lot of attention in recent times as compact, low-cost biosensors with fast response time and label-free detection. Dual gate ISFETs have been shown to enhance detection sensitivity beyond the Nernst limit of 59 mV pH−1 when the back gate dielectric is much thicker than the top dielectric. However, the thicker back-dielectric limits its application for ultrascaled point-of-care devices. In this work, we introduce and demonstrate a pH sensor, with WSe2(top)/MoS2(bottom) heterostructure based double gated ISFET. The proposed device is capable of surpassing the Nernst detection limit and uses thin high-k hafnium oxide as the gate oxide. The 2D atomic layered structure, combined with nanometer-thick top and bottom oxides, offers excellent scalability and linear response with a maximum sensitivity of 362 mV pH−1. We have also used technology computer-aided (TCAD) simulations to elucidate the underlying physics, namely back gate electric field screening through channel and interface charges due to the heterointerface. The proposed mechanism is independent of the dielectric thickness that makes miniaturization of these devices easier. We also demonstrate super-Nernstian behavior with the flipped MoS2(top)/WSe2(bottom) heterostructure ISFET. The results open up a new pathway of 2D heterostructure engineering as an excellent option for enhancing ISFET sensitivity beyond the Nernst limit, for the next-generation of label-free biosensors for single-molecular detection and point-of-care diagnostics.

Compact and Energy Efficient Neuron With Tunable Spiking Frequency in 22-nm FDSOI

In this paper, we present a mixed-signal integrate and fire neuron designed in a 22-nm FDSOI technology. In this novel design, we deploy the back-gate terminal of FDSOI technology for a tunable design. For the first time, we show analytically and with pre- and post-layout simulations a neuron with tunable spiking frequency using the back-gate voltage of FDSOI technology. The neuron circuit is designed in the sub-threshold region and dissipates an ultra-low energy per spike of the order of Femto Joules per spike. With the layout area of only 30um^2, this is the smallest neuron circuit reported to date.

Compact and Energy Efficient Neuron With Tunable Spiking Frequency in 22-nm FDSOI

In this paper, we present a mixed-signal integrate and fire neuron designed in a 22-nm FDSOI technology. In this novel design, we deploy the back-gate terminal of FDSOI technology for a tunable design. For the first time, we show analytically and with pre- and post-layout simulations a neuron with tunable spiking frequency using the back-gate voltage of FDSOI technology. The neuron circuit is designed in the sub-threshold region and dissipates an ultra-low energy per spike of the order of Femto Joules per spike. With the layout area of only 30um^2, this is the smallest neuron circuit reported to date.

Step-graded AlGaN vs superlattice: Role of strain relief layer in dynamic on-resistance degradation

In this work, we study the impacts of different types of strain relief layer (SRL) on dynamic on-resistance (Ron) degradation of GaN power devices on Si by back-gate ramping and vertical leakage measurement. Our study reveals that the SRL has important effects on the dynamic Ron. Compared with step-graded AlGaN SRL, the superlattice SRL possesses much more energy barriers, which can more effectively block the leakage of holes from GaN buffer and the injection of electrons from Si substrate. Enhancing the carrier blocking ability of SRL could contribute to the suppression of dynamic Ron degradation.

Electronic Sensing Platform (ESP) Based on Open-Gate Junction Field-Effect Transistor (OG-JFET) for Life Science Applications: Design, Modeling and Experimental Results

This paper presents a new field-effect sensor called open-gate junction gate field-effect transistor (OG-JFET) for biosensing applications. The OG-JFET consists of a p-type channel on top of an n-type layer in which the p-type serves as the sensing conductive layer between two ohmic contacted sources and drain electrodes. The structure is novel as it is based on a junction field-effect transistor with a subtle difference in that the top gate (n-type contact) has been removed to open the space for introducing the biomaterial and solution. The channel can be controlled through a back gate, enabling the sensor’s operation without a bulky electrode inside the solution. In this research, in order to demonstrate the sensor’s functionality for chemical and biosensing, we tested OG-JFET with varying pH solutions, cell adhesion (human oral neutrophils), human exhalation, and DNA molecules. Moreover, the sensor was simulated with COMSOL Multiphysics to gain insight into the sensor operation and its ion-sensitive capability. The complete simulation procedures and the physics of pH modeling is presented here, being numerically solved in COMSOL Multiphysics software. The outcome of the current study puts forward OG-JFET as a new platform for biosensing applications.

Fabrication And pH Sensing Characteristics Measurement of Back Gate ZnO Thin Film Planar FET

Here in we demonstrate the design of a low- cost zinc oxide (ZnO) thin-film planar transistor-based pH sensor controlled by the bottom gate fabricated by a fairly simple fabrication approach. The performance of the fabricated device is evaluated by electrical as well as surface characterization. The surface morphology is analyzed by scanning electron microscope (SEM) and atomic force microscopy (AFM) and it shows surface properties that are essential for a device to function as a pH sensor. The fabricated thin-film FET comprises Zinc Oxide (ZnO) as a channel layer of length 6 µm and thickness 200 nm, Silicon Nitride (Si3N4) as a pas- sivation layer, and Aluminum (Al) as a contact layer. The effect on pH sensitivity for varied channel lengths (6 µm, 12 µm, and 15 µm) is also examined and opti- mum results have been achieved at channel length = 6 µm. The change in threshold voltage (ΔVth) & change in current (ΔImax) are used as a sensing metrics to an- alyze the sensing performance of the device. The device shows excellent pH sensitivity in terms of average cur- rent and average voltage sensitivity 120.97 mA/pH and 97.85 mv/pH respectively at pH ranging from 3.2 to 11.1 with best pH stability (linearity) for pH value 4 to 10. The voltage sensitivity is higher than the Nernstian value (59 mv/pH) at room temperature.