A charge-plasma-based dual-metal-gate recessed-source/drain dopingless junctionless transistor with enhanced analog and RF performance

2020 ◽  
Vol 19 (3) ◽  
pp. 1085-1099
Author(s):  
Prateek Kishor Verma ◽  
Yogesh Kumar Verma ◽  
Varun Mishra ◽  
Santosh Kumar Gupta
Keyword(s):  
Metal Gate ◽  
Charge Plasma ◽  
Junctionless Transistor ◽  
Dual Metal ◽  
Rf Performance ◽  
A Charge

Effect of Au-Al Dual-Metal Gate on 3D Double-Gate Junctionless Transistor Performance

2021 ◽  
pp. 421-429
Author(s):  
Achinta Baidya ◽  
Rajesh Saha ◽  
Amarnath Gaini ◽  
Chaitali Koley ◽  
Somen Debnath ◽  
...  
Keyword(s):  
Double Gate ◽  
Metal Gate ◽  
Junctionless Transistor ◽  
Dual Metal

Design and Analysis of Dual-Metal-Gate Double-Cavity Charge-Plasma-TFET as a Label Free Biosensor

2020 ◽  
Vol 20 (23) ◽  
pp. 13969-13975 ◽  
Author(s):  
Mahalaxmi ◽  
Bibhudendra Acharya ◽  
Guru Prasad Mishra
Keyword(s):  
Label Free ◽  
Metal Gate ◽  
Charge Plasma ◽  
Dual Metal

Advances in DC/RF Performance of AlGaN/GaN MIS-HEMT by Incorporating Dual Metal Gate Architecture

2020 ◽  
pp. 1-9
Author(s):  
Ajay Kumar Visvkarma ◽  
Khushwant Sehra ◽  
Robert Laishram ◽  
D. S. Rawal ◽  
Manoj Saxena
Keyword(s):  
Metal Gate ◽  
Dual Metal ◽  
Rf Performance

Optimization of the geometry of a charge plasma double-gate junctionless transistor for improved RF stability

2019 ◽  
Vol 18 (3) ◽  
pp. 906-917
Author(s):  
Adhithan Pon ◽  
Arkaprava Bhattacharyya ◽  
B. Padmanaban ◽  
R. Ramesh
Keyword(s):  
Double Gate ◽  
Charge Plasma ◽  
Junctionless Transistor ◽  
A Charge

Metal Wet Etch Process Development for Dual Metal Gate CMOS

2005 ◽  
Vol 8 (12) ◽  
pp. G333 ◽  
Author(s):  
Muhammad Mustafa Hussain ◽  
Naim Moumen ◽  
Joel Barnett ◽  
Jason Saulters ◽  
David Baker ◽  
...  
Keyword(s):  
Process Development ◽  
Metal Gate ◽  
Dual Metal ◽  
Wet Etch

Feasibility study of using thin aluminum nitride film as a buffer layer for dual metal gate process

2004 ◽  
Vol 462-463 ◽  
pp. 15-18 ◽  
Author(s):  
Chang Seo Park ◽  
Byung Jin Cho ◽  
N. Balasubramanian ◽  
Dim-Lee Kwong
Keyword(s):  
Aluminum Nitride ◽  
Buffer Layer ◽  
Feasibility Study ◽  
Nitride Film ◽  
Metal Gate ◽  
Thin Aluminum ◽  
Dual Metal
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