Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations
2010 ◽
Vol 49
(9)
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pp. 096506
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2012 ◽
Vol 51
(8R)
◽
pp. 086504
◽
2012 ◽
Vol 51
◽
pp. 086504
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2014 ◽
Vol 53
(8)
◽
pp. 084002
◽
2003 ◽
Vol 21
(1)
◽
pp. 254
◽