Low-Temperature Crystallization of Hydrogenated Amorphous Silicon Induced by Nickel Silicide Formation

1990 ◽  
Vol 29 (Part 1, No. 12) ◽  
pp. 2698-2704 ◽  
Author(s):  
Yunosuke Kawazu ◽  
Hiroshi Kudo ◽  
Seinosuke Onari ◽  
Toshihiro Arai
Keyword(s):  
Low Temperature ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Nickel Silicide ◽  
Silicide Formation ◽  
Low Temperature Crystallization ◽  
Hydrogenated Amorphous ◽  
Temperature Crystallization

Iron silicide formation on hydrogenated amorphous silicon

1996 ◽  
Vol 275 (1-2) ◽  
pp. 191-194 ◽  
Author(s):  
P. Grunow ◽  
H. Paes ◽  
C. Gatts ◽  
W. Losch
Keyword(s):  
Amorphous Silicon ◽  
Iron Silicide ◽  
Hydrogenated Amorphous Silicon ◽  
Silicide Formation ◽  
Hydrogenated Amorphous

Laser stimulated low-temperature crystallization of amorphous silicon

2006 ◽  
Vol 32 (3) ◽  
pp. 259-261 ◽  
Author(s):  
S. A. Avsarkisov ◽  
Z. V. Jibuti ◽  
N. D. Dolidze ◽  
B. E. Tsekvava
Keyword(s):  
Low Temperature ◽  
Amorphous Silicon ◽  
Low Temperature Crystallization ◽  
Temperature Crystallization
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