Fluctuation-Free Electron Emission from Non-Formed Metal-Insulator-Metal (MIM) Cathodes Fabricated by Low Current Anodic Oxidation

1993 ◽  
Vol 32 (Part 2, No. 11B) ◽  
pp. L1695-L1697 ◽  
Author(s):  
Toshiaki Kusunoki ◽  
Mutsumi Suzuki ◽  
Susumu Sasaki ◽  
Tomio Yaguchi ◽  
Toshiyuki Aida
2011 ◽  
Vol 1354 ◽  
Author(s):  
Johannes Hopster ◽  
Detlef Diesing ◽  
Andreas Wucher ◽  
Marika Schleberger

ABSTRACTThe generation of hot charge carriers within a solid bombarded by charged particles is investigated using biased thin film metal-insulator-metal (MIM) devices. For slow, highly charged ions approaching a metal surface the main dissipation process is electronic excitation of the substrate, leading to electron emission into the vacuum and internal electron emission across the MIM junction. In order to gain a deeper understanding of the distribution and transport of the excited charge carriers leading to the measured device current, we compare ion induced and electron induced excitation processes in terms of absolute internal emission yields as well as their dependence on the applied bias voltage.


2010 ◽  
Vol 81 (7) ◽  
Author(s):  
Domocos Kovacs ◽  
Artur Golczewski ◽  
Gregor Kowarik ◽  
Friedrich Aumayr ◽  
Detlef Diesing

1999 ◽  
Vol 75 (25) ◽  
pp. 4007-4009 ◽  
Author(s):  
R. Heer ◽  
D. Rakoczy ◽  
G. Ploner ◽  
G. Strasser ◽  
E. Gornik ◽  
...  

2011 ◽  
Author(s):  
Terrance O'Regan ◽  
Matthew Chin ◽  
Cheng Tan ◽  
Anthony Birdwell

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